A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphthoquinone as a Photosensitive Compound

Yasufumi Watanabe; Yuji Shibasaki; Shinji Ando; Mitsuru Ueda

doi:10.1021/cm0115362

A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphthoquinone as a Photosensitive Compound

Chemistry of Materials ◽

10.1021/cm0115362 ◽

2002 ◽

Vol 14 (4) ◽

pp. 1762-1766 ◽

Cited By ~ 27

Author(s):

Yasufumi Watanabe ◽

Yuji Shibasaki ◽

Shinji Ando ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Positive Type ◽

Polyimide Precursor

Download Full-text

Alkaline-developable Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) and Fluorinated Diazonaphthoquinone

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.26.351 ◽

2013 ◽

Vol 26 (3) ◽

pp. 351-356 ◽

Cited By ~ 9

Author(s):

Yusuke Inoue ◽

Tomoya Higashihara ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Positive Type

Download Full-text

Novel Partial Esterification Reaction in Poly(amic acid) and Its Application for Positive-Tone Photosensitive Polyimide Precursor

Polymer Journal ◽

10.1295/polymj.pj2008333 ◽

2009 ◽

Vol 41 (8) ◽

pp. 604-608 ◽

Cited By ~ 34

Author(s):

Masao Tomikawa ◽

Satoshi Yoshida ◽

Naoyo Okamoto

Keyword(s):

Amic Acid ◽

Esterification Reaction ◽

Polyimide Precursor

Download Full-text

Positive-Working Alkaline-Developable Photosensitive Polyimide Precursor Based on Poly(amic acid) and Dissolution Inhibitor.

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.10.55 ◽

1997 ◽

Vol 10 (1) ◽

pp. 55-60 ◽

Cited By ~ 20

Author(s):

Osamu Haba ◽

Masaki Okazaki ◽

Tomonari Nakayama ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Polyimide Precursor

Download Full-text

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

Journal of Polymer Science Part A Polymer Chemistry ◽

10.1002/(sici)1099-0518(199812)36:17<3197::aid-pola23>3.0.co;2-3 ◽

1998 ◽

Vol 36 (17) ◽

pp. 3197-3197 ◽

Cited By ~ 1

Author(s):

H. Seino ◽

A. Mochizuki ◽

O. Haba ◽

M. Ueda

Keyword(s):

Dielectric Constant ◽

Dimensional Stability ◽

Amic Acid ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Polyimide Precursor

Download Full-text

A Positive-Type Alkaline-Developable Photosensitive Polyimide Based on the Poly(amic acid) from 2,2′,6,6′-Biphenyltetracarboxylic Dianhydride and 1,3-Bis(4-aminophenoxy)benzene, and a Diazonaphthoquinone

Polymer Journal ◽

10.1295/polymj.pj2006051 ◽

2006 ◽

Vol 38 (11) ◽

pp. 1189-1193 ◽

Cited By ~ 8

Author(s):

Katsuya Sakayori ◽

Yuji Shibasaki ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Positive Type ◽

Biphenyltetracarboxylic Dianhydride

Download Full-text

A new positive-type photoreactive polyimide precursor using 1,4-dihydropyridine derivative

Polymer Engineering & Science ◽

10.1002/pen.760322117 ◽

1992 ◽

Vol 32 (21) ◽

pp. 1634-1641 ◽

Cited By ~ 28

Author(s):

Toshihiko Omote ◽

Tsuguo Yamaoka

Keyword(s):

Positive Type ◽

Dihydropyridine Derivative ◽

Polyimide Precursor

Download Full-text

Facile formulation of alkaline-developable positive-type photosensitive polyimide based on fluorinated poly(amic acid), poly(amic acid), and fluorinated diazonaphthoquinone

Journal of Materials Chemistry C ◽

10.1039/c3tc00324h ◽

2013 ◽

Vol 1 (14) ◽

pp. 2553 ◽

Cited By ~ 13

Author(s):

Yusuke Inoue ◽

Yuta Saito ◽

Tomoya Higashihara ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Positive Type

Download Full-text

A water-soluble polyimide precursor: Synthesis and characterization of poly(amic acid) salt

Macromolecular Research ◽

10.1007/bf03218398 ◽

2004 ◽

Vol 12 (3) ◽

pp. 263-268 ◽

Cited By ~ 29

Author(s):

Jun Yang ◽

Myong-Hoon Lee

Keyword(s):

Amic Acid ◽

Water Soluble ◽

Synthesis And Characterization ◽

Acid Salt ◽

Precursor Synthesis ◽

Soluble Polyimide ◽

Polyimide Precursor

Download Full-text

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

Journal of Polymer Science Part A Polymer Chemistry ◽

10.1002/(sici)1099-0518(19980930)36:13<2261::aid-pola12>3.0.co;2-8 ◽

1998 ◽

Vol 36 (13) ◽

pp. 2261-2267 ◽

Cited By ~ 27

Author(s):

Hiroshi Seino ◽

Amane Mochizuki ◽

Osamu Haba ◽

Mitsuru Ueda

Keyword(s):

Dielectric Constant ◽

Dimensional Stability ◽

Amic Acid ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Polyimide Precursor

Download Full-text

Low-Temperature-Curable and Positive-Type Photosensitive Polyimide with High Mechanical Strength, High Resolution and Good Pot-Life Based on Chain Extendable Poly(Amic Acid), Thermal Degradable Crosslinker, Chain Extender, Thermal Base Generator and Photoacid Generator

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.33.623 ◽

2020 ◽

Vol 33 (6) ◽

pp. 623-630

Author(s):

Yao-Ming Yeh ◽

Vamsi Krishna Karapala ◽

Mitsuru Ueda ◽

Chain-Shu Hsu

Keyword(s):

High Resolution ◽

Low Temperature ◽

Mechanical Strength ◽

Amic Acid ◽

Chain Extender ◽

High Mechanical Strength ◽

Positive Type ◽

Pot Life ◽

Photoacid Generator

Download Full-text