Low-temperature atmospheric pressure chemical vapor deposition of polycrystalline tin nitride thin films

1992 ◽  
Vol 4 (1) ◽  
pp. 68-71 ◽  
Author(s):  
Roy G. Gordon ◽  
David M. Hoffman ◽  
Umar Riaz
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Pressure Chemical ◽  
Tin Nitride

Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

2004 ◽  
Vol 16 (6) ◽  
pp. 1120-1125 ◽  
Author(s):  
Christopher S. Blackman ◽  
Claire J. Carmalt ◽  
Shane A. O'Neill ◽  
Ivan P. Parkin ◽  
Leonardo Apostolico ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Metal Phosphide ◽  
Pressure Chemical

Growth of Antimony Thin Films Using Perbenzylated Organometallic Precursors

1998 ◽  
Vol 547 ◽  
Author(s):  
Michael P. Remington ◽  
Smuruthi Kamepalli ◽  
Philip Boudjouk ◽  
Bryan R. Jarabek ◽  
Dean G. Grier ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Carbon ◽  
Design Strategies ◽  
Glass Substrates ◽  
Pressure Chemical ◽  
Organometallic Precursors

AbstractThe low temperature (ca. 300°C) deposition of antimony films by low-pressure chemical vapor deposition (LPCVD) on glass substrates from tribenzylantimony, Bn3Sb, is described. The facile elimination of the benzyl ligands results in preferentially oriented antimony films with low carbon content. The pyrolysis, decomposition mechanism and precursor design strategies are discussed. In addition, the deposition of bismuth from tribenzylbismuth, Bn3Bi, is presented. The potential for alloy growth using these precursors is discussed. Resulting films were characterized by XRD, SEM, and AFM.

Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

2013 ◽  
Vol 1 (39) ◽  
pp. 6188 ◽  
Author(s):  
Erik R. Klobukowski ◽  
Wyatt E. Tenhaeff ◽  
James W. McCamy ◽  
Caroline S. Harris ◽  
Chaitanya K. Narula
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Solar Panels ◽  
Pressure Chemical ◽  
High Silica
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