Atmospheric pressure chemical vapor deposition of tin nitride thin films using a halide source

2000 ◽  
Vol 10 (12) ◽  
pp. 2835-2837 ◽  
Author(s):  
Naoyuki Takahashi ◽  
Kazuhiko Terada ◽  
Takato Nakamura
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Pressure Chemical ◽  
Tin Nitride

Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

2004 ◽  
Vol 16 (6) ◽  
pp. 1120-1125 ◽  
Author(s):  
Christopher S. Blackman ◽  
Claire J. Carmalt ◽  
Shane A. O'Neill ◽  
Ivan P. Parkin ◽  
Leonardo Apostolico ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Metal Phosphide ◽  
Pressure Chemical

Atmospheric pressure chemical vapor deposition of high silica SiO2–TiO2 antireflective thin films for glass based solar panels

2013 ◽  
Vol 1 (39) ◽  
pp. 6188 ◽  
Author(s):  
Erik R. Klobukowski ◽  
Wyatt E. Tenhaeff ◽  
James W. McCamy ◽  
Caroline S. Harris ◽  
Chaitanya K. Narula
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Chemical Vapor ◽  
Solar Panels ◽  
Pressure Chemical ◽  
High Silica
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