Semiconductor Materials Defect Diagnostics for Submicrometer Very Large Scale Integration Technology

ACS Symposium Series - Microelectronics Processing: Inorganic Materials Characterization ◽

10.1021/bk-1986-0295.ch005 ◽

1986 ◽

pp. 75-95

Author(s):

G. A. Rozgonyi ◽

D. K. Sadana

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Semiconductor Materials ◽

Integration Technology ◽

Defect Diagnostics ◽

Large Scale Integration ◽

Scale Integration

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Possible applications of tantalum silicide for very-large-scale integration technology

Thin Solid Films ◽

10.1016/0040-6090(86)90167-7 ◽

1986 ◽

Vol 140 (1) ◽

pp. 131-136 ◽

Cited By ~ 7

Author(s):

K. Hieber ◽

F. Neppl

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Integration Technology ◽

Large Scale Integration ◽

Scale Integration ◽

Tantalum Silicide

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Very-Large-Scale Integration Technology: History and Features

FPGA-Based Embedded System Developer's Guide ◽

10.1201/9781315156200-1 ◽

2018 ◽

pp. 3-21

Author(s):

A. Arockia Bazil Raj

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Integration Technology ◽

Large Scale Integration ◽

Scale Integration ◽

Technology History

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Future very-large-scale integration technology

Materials Science and Engineering B ◽

10.1016/0921-5107(88)90001-3 ◽

1988 ◽

Vol 1 (3-4) ◽

pp. 213-220 ◽

Cited By ~ 2

Author(s):

Masataka Hirose

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Integration Technology ◽

Large Scale Integration ◽

Scale Integration

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A comparison of tungsten film deposition techniques for very large scale integration technology

Thin Solid Films ◽

10.1016/0040-6090(87)90206-9 ◽

1987 ◽

Vol 153 (1-3) ◽

pp. 469-478 ◽

Cited By ~ 28

Author(s):

K.Y. Ahn

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Film Deposition ◽

Integration Technology ◽

Tungsten Film ◽

Large Scale Integration ◽

Scale Integration ◽

Deposition Techniques

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Multiple Leads With a Switch Mode for Lossless and Lossy Compression Using Very-Large-Scale Integration Technology

IEEE Access ◽

10.1109/access.2018.2879412 ◽

2018 ◽

Vol 6 ◽

pp. 67291-67300

Author(s):

Yun-Hua Tseng ◽

Yuan-Ho Chen ◽

Chih-Wen Lu

Keyword(s):

Large Scale ◽

Lossy Compression ◽

Very Large Scale Integration ◽

Integration Technology ◽

Switch Mode ◽

Large Scale Integration ◽

Scale Integration ◽

Lossless And Lossy Compression

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A comparison of tungsten film deposition techniques for very large scale integration technology

Vacuum ◽

10.1016/0042-207x(89)90321-7 ◽

1989 ◽

Vol 39 (5) ◽

pp. 494-495

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Film Deposition ◽

Integration Technology ◽

Tungsten Film ◽

Large Scale Integration ◽

Scale Integration ◽

Deposition Techniques

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Three hundred micron squared all-solid-state Li ion secondary battery fabricated by Si very large scale integration technology

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2012.10.021 ◽

2013 ◽

Vol 551 ◽

pp. 44-47 ◽

Cited By ~ 3

Author(s):

Yuuki Yamada ◽

Takaaki Nozaki ◽

Kazuo Kuriyama ◽

Kazumasa Kushida

Keyword(s):

Solid State ◽

Large Scale ◽

Very Large Scale Integration ◽

Integration Technology ◽

Secondary Battery ◽

Large Scale Integration ◽

Li Ion ◽

Scale Integration

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Plasma etching of silicides and polycides in very-large-scale integration technology

Thin Solid Films ◽

10.1016/0040-6090(86)90168-9 ◽

1986 ◽

Vol 140 (1) ◽

pp. 137-148 ◽

Cited By ~ 3

Author(s):

L. Peccoud ◽

Ph. Laporte

Keyword(s):

Plasma Etching ◽

Large Scale ◽

Very Large Scale Integration ◽

Integration Technology ◽

Large Scale Integration ◽

Scale Integration

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SEMICONDUCTOR MATERIALS AND PROCESS TECHNOLOGY HANDBOOK: For Very Large Scale Integration (VLSI) and Ultra Large Scale Integration (ULSI)

Electronics Reliability and Measurement Technology ◽

10.1016/b978-0-8155-1171-7.50019-6 ◽

1988 ◽

pp. ibc2 ◽

Cited By ~ 3

Author(s):

Gary E. McGuire

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Semiconductor Materials ◽

Process Technology ◽

Large Scale Integration ◽

Scale Integration

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EOS (Electrical Overstress) Protection for VLSI (Very Large Scale Integration) Devices.

10.21236/ada150333 ◽

1984 ◽

Author(s):

D. D. Wilson ◽

W. E. Echols ◽

M. G. Rossi

Keyword(s):

Large Scale ◽

Very Large Scale Integration ◽

Large Scale Integration ◽

Electrical Overstress ◽

Scale Integration

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