Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride

2014 ◽  
Vol 6 (13) ◽  
pp. 10534-10541 ◽  
Author(s):  
Ciaran A. Murray ◽  
Simon D. Elliott ◽  
Dennis Hausmann ◽  
Jon Henri ◽  
Adrien LaVoie
Keyword(s):  
Reaction Mechanism ◽  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Exposure Time ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Layer Deposition

Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

2008 ◽  
Vol 103 (11) ◽  
pp. 113509 ◽  
Author(s):  
Sung-Soo Yim ◽  
Do-Joong Lee ◽  
Ki-Su Kim ◽  
Soo-Hyun Kim ◽  
Tae-Sik Yoon ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Nucleation Kinetics ◽  
Layer Deposition ◽  
Kinetics Of

Selective atomic layer deposition of MoSix on Si (0 0 1) in preference to silicon nitride and silicon oxide

2018 ◽  
Vol 462 ◽  
pp. 1008-1016 ◽  
Author(s):  
Jong Youn Choi ◽  
Christopher F. Ahles ◽  
Raymond Hung ◽  
Namsung Kim ◽  
Andrew C. Kummel
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Layer Deposition

Reaction Mechanism of Atomic Layer Deposition of Aluminum Sulfide using Trimethylaluminum and Hydrogen Sulfide

2021 ◽  
Author(s):  
Yanghong Yu ◽  
Zhongchao Zhou ◽  
Lina Xu ◽  
Yihong Ding ◽  
Guoyong Fang
Keyword(s):  
Hydrogen Sulfide ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Sulfides ◽  
Layer Deposition

Atomic layer deposition (ALD) is a nanopreparation technique for materials and is widely used in the fields of microelectronics, energy and catalysis. ALD methods for metal sulfides, such as Al2S3...

Reaction Mechanism of Pt Atomic Layer Deposition on Various Textile Surfaces

2019 ◽  
Vol 31 (21) ◽  
pp. 8995-9002
Author(s):  
Il-Kwon Oh ◽  
Jong Seo Park ◽  
Mohammad Rizwan Khan ◽  
Kangsik Kim ◽  
Zonghoon Lee ◽  
...  
Keyword(s):  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Reaction Mechanism Underlying Atomic Layer Deposition of Antimony Telluride Thin Films

2016 ◽  
Vol 16 (5) ◽  
pp. 4924-4928 ◽  
Author(s):  
Byeol Han ◽  
Yu-Jin Kim ◽  
Jae-Min Park ◽  
Luchana L Yusup ◽  
Hana Ishii ◽  
...  
Keyword(s):  
Thin Films ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Antimony Telluride ◽  
Layer Deposition

Atomic layer deposition of carbon doped silicon oxide by precursor design and process tuning

2018 ◽  
Vol 36 (2) ◽  
pp. 021509 ◽  
Author(s):  
Meiliang Wang ◽  
Haripin Chandra ◽  
Xinjian Lei ◽  
Anupama Mallikarjunan ◽  
Kirk Cuthill ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Carbon Doped ◽  
Layer Deposition ◽  
Doped Silicon
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