Transfer of Pre-Assembled Block Copolymer Thin Film to Nanopattern Unconventional Substrates

2014 ◽  
Vol 6 (12) ◽  
pp. 9442-9448 ◽  
Author(s):  
Jonathan W. Choi ◽  
Myungwoong Kim ◽  
Nathaniel S. Safron ◽  
Michael S. Arnold ◽  
Padma Gopalan
Keyword(s):  
Small ◽  
2021 ◽  
pp. 2100437
Author(s):  
Deepra Bhattacharya ◽  
Subarna Kole ◽  
Orhan Kizilkaya ◽  
Joseph Strzalka ◽  
Polyxeni P. Angelopoulou ◽  
...  

2021 ◽  
Author(s):  
Olufemi Olatidoye ◽  
Daria Thomas ◽  
Bishnu Bastakoti

A facile synthesis of a mesoporous TiO2 thin film is reported using poly(styrene-2-vinyl pyridine-ethylene oxide) polymeric micelle as a synthetic template. As the Ti precursor strongly binds with polymeric micelles...


2015 ◽  
Vol 9 (6) ◽  
pp. 525-535 ◽  
Author(s):  
G. del C. Pizarro ◽  
O. G. Marambio ◽  
M. Jeria-Orell ◽  
C. M. Gonzalez-Henriquez ◽  
M. Sarabia-Vallejos ◽  
...  

APL Materials ◽  
2017 ◽  
Vol 5 (9) ◽  
pp. 099901
Author(s):  
Norihiro Suzuki ◽  
Minoru Osada ◽  
Motasim Billah ◽  
Zeid Abdullah Alothman ◽  
Yoshio Bando ◽  
...  

Soft Matter ◽  
2006 ◽  
Vol 2 (12) ◽  
pp. 1089-1094 ◽  
Author(s):  
Violetta Olszowka ◽  
Markus Hund ◽  
Volker Kuntermann ◽  
Sabine Scherdel ◽  
Larisa Tsarkova ◽  
...  

2020 ◽  
Vol 58 (17) ◽  
pp. 2347-2354
Author(s):  
Hiroaki Nobuoka ◽  
Masakazu Nagasawa ◽  
Nalinthip Chanthaset ◽  
Hiroaki Yoshida ◽  
Yoshiaki Haramiishi ◽  
...  

2020 ◽  
Vol 5 (10) ◽  
pp. 1642-1657
Author(s):  
Cian Cummins ◽  
Guillaume Pino ◽  
Daniele Mantione ◽  
Guillaume Fleury

Recently engineered high χ-low N block copolymers for nanolithography are evaluated. Synthetic routes together with thin film processing strategies are highlighted that could enable the relentless scaling for logic technologies at sub-10 nanometres.


2020 ◽  
Vol 7 (18) ◽  
pp. 2001002
Author(s):  
Shanshan Yin ◽  
Ting Tian ◽  
Kerstin S. Wienhold ◽  
Christian L. Weindl ◽  
Renjun Guo ◽  
...  

Polymers ◽  
2020 ◽  
Vol 12 (4) ◽  
pp. 781 ◽  
Author(s):  
Sedakat Altinpinar ◽  
Wael Ali ◽  
Patrick Schuchardt ◽  
Pinar Yildiz ◽  
Hui Zhao ◽  
...  

On the basis of the major application for block copolymers to use them as separation membranes, lithographic mask, and as templates, the preparation of highly oriented nanoporous thin films requires the selective removal of the minor phase from the pores. In the scope of this study, thin film of polystyrene-block-poly(ethylene oxide) block copolymer with a photocleavable junction groups based on ortho-nitrobenzylester (ONB) (PS-hν-PEO) was papered via the spin coating technique followed by solvent annealing to obtain highly-ordered cylindrical domains. The polymer blocks are cleaved by means of a mild UV exposure and then the pore material is washed out of the polymer film by ultra-pure water resulting in arrays of nanoporous thin films to remove one block. The removal of the PEO materials from the pores was proven using the grazing-incidence small-angle X-ray scattering (GISAXS) technique. The treatment of the polymer film during the washing process was observed in real time after two different UV exposure time (1 and 4 h) in order to draw conclusions regarding the dynamics of the removal process. In-situ X-ray reflectivity measurements provide statistically significant information about the change in the layer thickness as well as the roughness and electron density of the polymer film during pore formation. 4 H UV exposure was found to be more efficient for PEO cleavage. By in-situ SFM measurements, the structure of the ultra-thin block copolymer films was also analysed and, thus, the kinetics of the washing process was elaborated. The results from both measurements confirmed that the washing procedure induces irreversible change in morphology to the surface of the thin film.


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