Large scale alignment of a lamellar block copolymer thin film via electric fields: a time-resolved SFM study

Soft Matter ◽  
2006 ◽  
Vol 2 (12) ◽  
pp. 1089-1094 ◽  
Author(s):  
Violetta Olszowka ◽  
Markus Hund ◽  
Volker Kuntermann ◽  
Sabine Scherdel ◽  
Larisa Tsarkova ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Electric Fields ◽  
Large Scale ◽  
Time Resolved ◽  
Large Scale Alignment

Cobalt Nanoparticles Growth on a Block Copolymer Thin Film: A Time-Resolved GISAXS Study

Langmuir ◽  
2013 ◽  
Vol 29 (21) ◽  
pp. 6331-6340 ◽  
Author(s):  
Ezzeldin Metwalli ◽  
Volker Körstgens ◽  
Kai Schlage ◽  
Robert Meier ◽  
Gunar Kaune ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Cobalt Nanoparticles ◽  
Time Resolved

D-56 Time-Resolved Small Angle Scattering Studies of Alignment of Block Copolymer Solutions Induced by Electric Fields

2004 ◽  
Vol 19 (2) ◽  
pp. 196-196
Author(s):  
V. Urban ◽  
A. Böker ◽  
H. Elbs ◽  
H. Hänsel ◽  
A. Knoll ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Electric Fields ◽  
Small Angle ◽  
Small Angle Scattering ◽  
Time Resolved ◽  
Angle Scattering

Large Scale Domain Alignment of a Block Copolymer from Solution Using Electric Fields

2002 ◽  
Vol 35 (4) ◽  
pp. 1319-1325 ◽  
Author(s):  
Alexander Böker ◽  
Armin Knoll ◽  
Hubert Elbs ◽  
Volker Abetz ◽  
Axel H. E. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Electric Fields ◽  
Large Scale ◽  
Domain Alignment

Large-Scale Alignment of ABC Block Copolymer Microdomains via Solvent Vapor Treatment

2000 ◽  
Vol 33 (3) ◽  
pp. 947-953 ◽  
Author(s):  
Kenji Fukunaga ◽  
Hubert Elbs ◽  
Robert Magerle ◽  
Georg Krausch
Keyword(s):  
Block Copolymer ◽  
Large Scale ◽  
Solvent Vapor ◽  
Vapor Treatment ◽  
Large Scale Alignment

The Structure and Properties of MoSi2 Thin Film in Mos Process

1980 ◽  
Vol 38 ◽  
pp. 326-327
Author(s):  
C.K. Wu ◽  
P. Chang ◽  
N. Godinho
Keyword(s):  
Thin Film ◽  
Integrated Circuits ◽  
High Performance ◽  
Large Scale ◽  
Process Development ◽  
Structure And Properties ◽  
Metal Silicides ◽  
High Oxidation ◽  
Important Approach ◽  
High Oxidation Resistance

Recently, the use of refractory metal silicides as low resistivity, high temperature and high oxidation resistance gate materials in large scale integrated circuits (LSI) has become an important approach in advanced MOS process development (1). This research is a systematic study on the structure and properties of molybdenum silicide thin film and its applicability to high performance LSI fabrication.

Electrolysis on a Chip with Tunable Thin Film Nanostructured PGM Electrocatalysts Generated from Self‐Assembled Block Copolymer Templates

Small ◽  
2021 ◽  
pp. 2100437
Author(s):  
Deepra Bhattacharya ◽  
Subarna Kole ◽  
Orhan Kizilkaya ◽  
Joseph Strzalka ◽  
Polyxeni P. Angelopoulou ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembled

scholarly journals Performance Improvement of ZnSnO Thin-Film Transistors with Low-Temperature Self-Combustion Reaction

Electronics ◽  
2021 ◽  
Vol 10 (9) ◽  
pp. 1099
Author(s):  
Ye-Ji Han ◽  
Se Hyeong Lee ◽  
So-Young Bak ◽  
Tae-Hee Han ◽  
Sangwoo Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Large Scale ◽  
Low Cost ◽  
Thermal Analyses ◽  
Thin Film Transistor ◽  
Sol Gel ◽  
Annealing Temperatures ◽  
Zinc Tin Oxide ◽  
Thermal Limitation

Conventional sol-gel solutions have received significant attention in thin-film transistor (TFT) manufacturing because of their advantages such as simple processing, large-scale applicability, and low cost. However, conventional sol-gel processed zinc tin oxide (ZTO) TFTs have a thermal limitation in that they require high annealing temperatures of more than 500 °C, which are incompatible with most flexible plastic substrates. In this study, to overcome the thermal limitation of conventional sol-gel processed ZTO TFTs, we demonstrated a ZTO TFT that was fabricated at low annealing temperatures of 350 °C using self-combustion. The optimized device exhibited satisfactory performance, with μsat of 4.72 cm2/V∙s, Vth of −1.28 V, SS of 0.86 V/decade, and ION/OFF of 1.70 × 106 at a low annealing temperature of 350 °C for one hour. To compare a conventional sol-gel processed ZTO TFT with the optimized device, thermogravimetric and differential thermal analyses (TG-DTA) and X-ray photoelectron spectroscopy (XPS) were implemented.

scholarly journals Elucidating the Onset of Plasticity in Sliding Contacts Using Differential Computational Orientation Tomography

2021 ◽  
Vol 69 (3) ◽  
Author(s):  
S. J. Eder ◽  
P. G. Grützmacher ◽  
M. Rodríguez Ripoll ◽  
J. F. Belak
Keyword(s):  
Grain Boundary ◽  
Large Scale ◽  
Surface Deformation ◽  
Boundary Migration ◽  
Material Design ◽  
Lattice Rotation ◽  
Time Resolved ◽  
Near Surface ◽  
Color Saturation ◽  
Dynamics Simulations

Abstract Depending on the mechanical and thermal energy introduced to a dry sliding interface, the near-surface regions of the mated bodies may undergo plastic deformation. In this work, we use large-scale molecular dynamics simulations to generate “differential computational orientation tomographs” (dCOT) and thus highlight changes to the microstructure near tribological FCC alloy surfaces, allowing us to detect subtle differences in lattice orientation and small distances in grain boundary migration. The analysis approach compares computationally generated orientation tomographs with their undeformed counterparts via a simple image analysis filter. We use our visualization method to discuss the acting microstructural mechanisms in a load- and time-resolved fashion, focusing on sliding conditions that lead to twinning, partial lattice rotation, and grain boundary-dominated processes. Extracting and laterally averaging the color saturation value of the generated tomographs allows us to produce quantitative time- and depth-resolved maps that give a good overview of the progress and severity of near-surface deformation. Corresponding maps of the lateral standard deviation in the color saturation show evidence of homogenization processes occurring in the tribologically loaded microstructure, frequently leading to the formation of a well-defined separation between deformed and undeformed regions. When integrated into a computational materials engineering framework, our approach could help optimize material design for tribological and other deformation problems. Graphic Abstract .

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