Silicon Oxide Nanowires: Facile and Controlled Large Area Fabrication of Vertically Oriented Silicon Oxide Nanowires for Photoluminescence and Sensor Applications

2013 ◽  
Vol 5 (18) ◽  
pp. 8932-8938 ◽  
Author(s):  
Taiwo R. Alabi ◽  
Dajun Yuan ◽  
David Bucknall ◽  
Suman Das
Keyword(s):  
Silicon Oxide ◽  
Large Area ◽  
Oxide Nanowires ◽  
Sensor Applications

scholarly journals Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 956
Author(s):  
Philipp Taus ◽  
Adrian Prinz ◽  
Heinz D. Wanzenboeck ◽  
Patrick Schuller ◽  
Anton Tsenov ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Silicon Oxide ◽  
Three Dimensional ◽  
Single Layer ◽  
Fabrication Technology ◽  
Large Area ◽  
Structural Colors ◽  
Biomimetic Structures ◽  
Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

Nanotechnology of nanotubes and nanowires: From aligned carbon nanotubes to silicon oxide nanowires

1998 ◽  
Author(s):  
N. Grobert ◽  
J. P. Hare ◽  
W. K. Hsu ◽  
H. W. Kroto ◽  
A. J. Pidduck ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Silicon Oxide ◽  
Oxide Nanowires ◽  
Aligned Carbon Nanotubes

Fabrication of large area nanogap electrodes for sensing applications

2013 ◽  
Vol 1530 ◽  
Author(s):  
A. Bendavid ◽  
L. Wieczorek ◽  
R. Chai ◽  
J. S. Cooper ◽  
B. Raguse
Keyword(s):  
Large Scale ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Current ◽  
Fabrication Method ◽  
Large Area ◽  
Sensor Applications ◽  
Sensing Applications ◽  
Lift Off ◽  
Nanogap Electrodes

ABSTRACTA large area nanogap electrode fabrication method combinig conventional lithography patterning with the of focused ion beam (FIB) is presented. Lithography and a lift-off process were used to pattern 50 nm thick platinum pads having an area of 300 μm × 300 μm. A range of 30-300 nm wide nanogaps (length from 300 μm to 10 mm ) were then etched using an FIB of Ga+ at an acceleration voltage of 30 kV at various beam currents. An investigation of Ga+ beam current ranging between 1-50 pA was undertaken to optimise the process for the current fabrication method. In this study, we used Monte Carlo simulation to calculate the damage depth in various materials by the Ga+. Calculation of the recoil cascades of the substrate atoms are also presented. The nanogap electrodes fabricated in this study were found to have empty gap resistances exceeding several hundred MΩ. A comparison of the gap length versus electrical resistance on glass substrates is presented. The results thus outline some important issues in low-conductance measurements. The proposed nanogap fabrication method can be extended to various sensor applications, such as chemical sensing, that employ the nanogap platform. This method may be used as a prototype technique for large-scale fabrication due to its simple, fast and reliable features.

Fabrication of Surface Plasmon-Coupled Si Nanodots in Au-Embedded Silicon Oxide Nanowires

2010 ◽  
Vol 22 (22) ◽  
pp. 2421-2425 ◽  
Author(s):  
Gyeong-Su Park ◽  
Hyuksang Kwon ◽  
Eun Kyung Lee ◽  
Seong Keun Kim ◽  
Jun Ho Lee ◽  
...  
Keyword(s):  
Surface Plasmon ◽  
Silicon Oxide ◽  
Oxide Nanowires

Indium-Assisted Plasma-Enhanced Low-Temperature Growth of Silicon Oxide Nanowires

2018 ◽  
Vol 215 (12) ◽  
pp. 1700749 ◽  
Author(s):  
Sergey Khmel ◽  
Evgeniy Baranov ◽  
Andrey Barsukov ◽  
Alexandr Zamchiy ◽  
Alexey Zaikovskii ◽  
...  
Keyword(s):  
Low Temperature ◽  
Silicon Oxide ◽  
Temperature Growth ◽  
Oxide Nanowires ◽  
Low Temperature Growth

scholarly journals Large Area Pressure Sensor for Smart Floor Sensor Applications — An occupancy Limiting Technology to Combat Social Distancing

2020 ◽  
pp. 1-1
Author(s):  
Venkatarao Selamneni ◽  
Aastha Dave ◽  
Pedja Mihailovic ◽  
Saroj Mondal ◽  
Parikshit Sahatiya
Keyword(s):  
Pressure Sensor ◽  
Large Area ◽  
Social Distancing ◽  
Sensor Applications

scholarly journals Large-Area Thermal Distribution Sensor Based on Multilayer Graphene Ink

Sensors ◽  
2020 ◽  
Vol 20 (18) ◽  
pp. 5188
Author(s):  
Tomi Koskinen ◽  
Taneli Juntunen ◽  
Ilkka Tittonen
Keyword(s):  
Signal To Noise Ratio ◽  
Graphene Film ◽  
Multilayer Graphene ◽  
Wearable Electronics ◽  
Large Area ◽  
Sensor Applications ◽  
Thermal Distribution ◽  
Sensing Applications ◽  
Detection Of Objects ◽  
Distribution Mapping

Emergent applications in wearable electronics require inexpensive sensors suited to scalable manufacturing. This work demonstrates a large-area thermal sensor based on distributed thermocouple architecture and ink-based multilayer graphene film. The proposed device combines the exceptional mechanical properties of multilayer graphene nanocomposite with the reliability and passive sensing performance enabled by thermoelectrics. The Seebeck coefficient of the spray-deposited films revealed an inverse thickness dependence with the largest value of 44.7 μV K−1 at 78 nm, which makes thinner films preferable for sensor applications. Device performance was demonstrated by touch sensing and thermal distribution mapping-based shape detection. Sensor output voltage in the latter application was on the order of 300 μV with a signal-to-noise ratio (SNR) of 35, thus enabling accurate detection of objects of different shapes and sizes. The results imply that films based on multilayer graphene ink are highly suitable to thermoelectric sensing applications, while the ink phase enables facile integration into existing fabrication processes.

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