scholarly journals Improvement of the Properties of Direct-Current Magnetron-Sputtered Al-Doped ZnO Polycrystalline Films Containing Retained Ar Atoms Using 10-nm-Thick Buffer Layers

ACS Omega ◽  
2019 ◽  
Vol 4 (11) ◽  
pp. 14526-14536 ◽  
Author(s):  
Junichi Nomoto ◽  
Hisao Makino ◽  
Tomohiko Nakajima ◽  
Tetsuo Tsuchiya ◽  
Tetsuya Yamamoto
2016 ◽  
Vol 120 (12) ◽  
pp. 125302 ◽  
Author(s):  
Junichi Nomoto ◽  
Katsuhiko Inaba ◽  
Minoru Osada ◽  
Shintaro Kobayashi ◽  
Hisao Makino ◽  
...  

Vacuum ◽  
2010 ◽  
Vol 85 (2) ◽  
pp. 184-186 ◽  
Author(s):  
Huafu Zhang ◽  
Hanfa Liu ◽  
Chengxin Lei ◽  
Changkun Yuan ◽  
Aiping Zhou

Nanoscale ◽  
2013 ◽  
Vol 5 (9) ◽  
pp. 3918 ◽  
Author(s):  
Liang Hu ◽  
Jun Huang ◽  
Haiping He ◽  
Liping Zhu ◽  
Shijiang Liu ◽  
...  

2013 ◽  
Vol 774-776 ◽  
pp. 954-959
Author(s):  
Xiao Jing Wang

The electrical properties need to be improved, although Aluminum doped ZnO thin films (ZnO: Al) have been successfully deposited on transparent TPT substrates by our group. In this paper, ZnO: Al film was deposited on TPT substrate with SiO2 buffer layer by RF magnetron sputtering. The obtained film had a hexagonal structure and highly (002) preferred orientation. Compared with ZAO film without buffer layer, the lattice constant distortion of the film with buffer layer was decreased and the compressive stress was decreased by 9.2%, reaching to 0.779GPa. The carrier concentration and hall mobility of the film with buffer layer were both increased; especially the carrier concentration was enhanced by two orders of magnitude, reaching to 2.65×10+20/cm3. The resistivity of ZAO film with SiO2 buffer layer was about 7.6×10-3 Ω·cm and the average transmittance was over 70% in the range of 450~900nm.


2012 ◽  
Vol 45 (2) ◽  
pp. 182-185 ◽  
Author(s):  
Waleed E. Mahmoud ◽  
F. Al-Marzouki ◽  
S. Al-Ameer ◽  
F. Al-Hazmi

Vertically aligned undoped ZnO and Sb-doped ZnO nanowires have been synthesized on a silicon substrate using the vapor–solid technique, without using a catalyst or predeposited buffer layers. The structure and morphology of the as-synthesized nanowires are characterized using X-ray diffraction, scanning and transmission electron microscopies, selected area electron diffraction, and electron dispersive X-ray spectroscopy. The results showed that the use of Si(111) is a critical factor for the growth of vertically aligned nanowires. This is a result of the lattice match on Si(111), which is more favorable with the ZnO lattice structure because the Si(111) surface is hexagonal and has a smaller lattice constant of 3.840 Å. The photoluminescence properties were also investigated at room temperature (300 K). The UV peaks of undoped and Sb-doped ZnO nanowires are located at 3.33 and 3.29 eV, respectively. This redshift of 0.04 eV in the Sb-doped ZnO indicates a reduction of the ZnO band gap caused by the Sb dopant. The temperature-dependent photoluminescence spectra of Sb-doped ZnO nanowires from 10 to 300 K were also examined. This measurement showed that at 10 K several peaks appear, at 3.36, 3.23 and 3.04 eV, which were assigned as acceptor-bound excitons, a donor–acceptor pair and a zinc-vacancy-related peak, respectively. These peaks are shifted with the increase of temperature up to 300 K.


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