Three-Dimensional Nanoscale Mapping of Porosity in Solution-Processed ITO Multilayer Thin Films for Patternable Transparent Electrodes

2019 ◽  
Vol 2 (2) ◽  
pp. 726-735
Author(s):  
Ning Xia ◽  
Valeria Lauter ◽  
Rosario A. Gerhardt
Keyword(s):  
Thin Films ◽  
Three Dimensional ◽  
Multilayer Thin Films ◽  
Transparent Electrodes ◽  
Solution Processed

scholarly journals Recent development of SPR spectroscopy as potential method for diagnosis of dengue virus E-protein

Sensor Review ◽  
2018 ◽  
Vol 38 (1) ◽  
pp. 106-116 ◽  
Author(s):  
Nur Alia Sheh Omar ◽  
Yap Wing Fen
Keyword(s):  
Thin Films ◽  
Dengue Virus ◽  
Three Dimensional ◽  
Optical Biosensor ◽  
Future Research ◽  
Multilayer Thin Films ◽  
Content Type ◽  
Sensing Applications ◽  
E Protein ◽  
Wide Range

Purpose This paper aims to review the potential application of surface plasmon resonance (SPR) in diagnosis of dengue virus (DENV-2) E-protein and the development of SPR to become an alternative DENV sensor. Design/methodology/approach In this review, the existing standard laboratory techniques to diagnosis of DENV are discussed, together with their drawbacks. To overcome these drawbacks, SPR has been aimed to be a valuable optical biosensor for identification of antibodies to the DENV antigen. The review also includes the future studies on three-dimensional poly(amidoamine) (PAMAM) dendrimer-surface-assembled monolayer (SAM)-Au multilayer thin films, which are envisaged to have high potential sensitive and selective detection ability toward target E-proteins. Findings Application of SPR in diagnosis of DENV emerged over recent years. A wide range of immobilized biorecognition molecules have been developed to combine with SPR as an effective sensor. The detection limit, sensitivity and selectivity of SPR sensing in DENV have been enhanced from time to time, until the present. Originality/value The main purpose of this review is to provide authors with up-to-date and useful information on sensing DENV using SPR and to introduce a novel three-dimensional PAMAM-SAM-Au multilayer thin films for future research on SPR sensing applications.

One-step coelectrodeposition-assisted layer-by-layer assembly of gold nanoparticles and reduced graphene oxide and its self-healing three-dimensional nanohybrid for an ultrasensitive DNA sensor

Nanoscale ◽  
2018 ◽  
Vol 10 (3) ◽  
pp. 1196-1206 ◽  
Author(s):  
Jayakumar Kumarasamy ◽  
María Belén Camarada ◽  
Dharuman Venkatraman ◽  
Huangxian Ju ◽  
Ramendra Sundar Dey ◽  
...  
Keyword(s):  
Thin Films ◽  
Three Dimensional ◽  
Multilayer Thin Films ◽  
Layer By Layer ◽  
Self Healing ◽  
Dna Sensor ◽  
Layer By Layer Assembly ◽  
Reduced Graphene ◽  
One Step ◽  
Layer Assembly

One-step coelectrodeposition-assisted layer-by-layer assembly was employed for preparing multilayer thin films with a controlled three-dimensional nanoarchitecture and application in an ultrasensitive DNA biosensor.

Three-Dimensional Organic Field-Effect Transistors Using Solution-Processed Thin Films of Benzothieno-Benzothiophene Derivatives

2011 ◽  
Vol 539 (1) ◽  
pp. 58/[398]-62/[402]
Author(s):  
Wanyan Li ◽  
Mayumi Uno ◽  
Yuri Hirose ◽  
Takafumi Uemura ◽  
Kazuo Takimiya ◽  
...  
Keyword(s):  
Thin Films ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Three Dimensional ◽  
Organic Field Effect Transistors ◽  
Solution Processed

Three-dimensional characterization of Co/Pd multilayer thin films using resonant soft x-ray scattering

2017 ◽  
Vol 95 (9) ◽  
Author(s):  
Samuel Flewett ◽  
Durgamadhab Mishra ◽  
Thiago J. A. Mori ◽  
Christian M. Günther ◽  
Juliano C. Denardin ◽  
...  
Keyword(s):  
Thin Films ◽  
Three Dimensional ◽  
Multilayer Thin Films ◽  
X Ray ◽  
X Ray Scattering ◽  
Ray Scattering

Characterization of reactive phase formation in sputter-deposited Ni/Al multilayer thin films using TEM

1996 ◽  
Vol 54 ◽  
pp. 1000-1001
Author(s):  
G. Lucadamo ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Phase Formation ◽  
Dark Field ◽  
Nickel Layer ◽  
Multilayer Thin Films ◽  
Cross Sectional ◽  
Dark Field Imaging ◽  
Transmission Electron ◽  
Sputter Deposited ◽  
Constant Heating

The subject of reactive phase formation in multilayer thin films of varying periodicity has stimulated much research over the past few years. Recent studies have sought to understand the reactions that occur during the annealing of Ni/Al multilayers. Dark field imaging from transmission electron microscopy (TEM) studies in conjunction with in situ x-ray diffraction measurements, and calorimetry experiments (isothermal and constant heating rate), have yielded new insights into the sequence of phases that occur during annealing and the evolution of their microstructure.In this paper we report on reactive phase formation in sputter-deposited lNi:3Al multilayer thin films with a periodicity A (the combined thickness of an aluminum and nickel layer) from 2.5 to 320 nm. A cross-sectional TEM micrograph of an as-deposited film with a periodicity of 10 nm is shown in figure 1. This image shows diffraction contrast from the Ni grains and occasionally from the Al grains in their respective layers.

The use of transmission and analytical electron microscopy in studying reactions and phase transformations in thin film

1993 ◽  
Vol 51 ◽  
pp. 842-843
Author(s):  
K. Barmak
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Phase Transformations ◽  
Analytical Electron Microscopy ◽  
Ex Situ ◽  
Multilayer Thin Films ◽  
Absolute Concentration ◽  
Analytical Electron ◽  
Deposition Step

Generally, processing of thin films involves several annealing steps in addition to the deposition step. During the annealing steps, diffusion, transformations and reactions take place. In this paper, examples of the use of TEM and AEM for ex situ and in situ studies of reactions and phase transformations in thin films will be presented.The ex situ studies were carried out on Nb/Al multilayer thin films annealed to different stages of reaction. Figure 1 shows a multilayer with dNb = 383 and dAl = 117 nm annealed at 750°C for 4 hours. As can be seen in the micrograph, there are four phases, Nb/Nb3-xAl/Nb2-xAl/NbAl3, present in the film at this stage of the reaction. The composition of each of the four regions marked 1-4 was obtained by EDX analysis. The absolute concentration in each region could not be determined due to the lack of thickness and geometry parameters that were required to make the necessary absorption and fluorescence corrections.

TEM studies of solid-state reactions in sputter-deposited Nb/Al multilayer thin films

1996 ◽  
Vol 54 ◽  
pp. 1020-1021
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Stoichiometric Composition ◽  
Analytical Electron Microscopy ◽  
Grain Structure ◽  
Solid State Reactions ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sputter Deposited

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.

Sign in / Sign up

Export Citation Format

Share Document