High-Performance Field-Effect Transistor and Logic Gates Based on GaS–MoS2 van der Waals Heterostructure

2020 ◽  
Vol 12 (4) ◽  
pp. 5106-5112 ◽  
Author(s):  
Gwang Hyuk Shin ◽  
Geon-Beom Lee ◽  
Eun-Su An ◽  
Cheolmin Park ◽  
Hyeok Jun Jin ◽  
...  
2018 ◽  
Vol 6 (42) ◽  
pp. 11232-11242 ◽  
Author(s):  
Xiaoguang Hu ◽  
Wenxiang Wang ◽  
Dongsheng Wang ◽  
Yonghao Zheng

Diradicaloids are promising materials for organic electronics and nonlinear optics due to their unique optical, electronic and magnetic properties. High performance organic field-effect transistor and photodetector based on diradicaloids have been achieved. Future potential applications in organic batteries, memory, logic gates and non-linear optics are expected.


Crystals ◽  
2017 ◽  
Vol 8 (1) ◽  
pp. 8 ◽  
Author(s):  
Jingyu Li ◽  
Xiaozhang Chen ◽  
David Zhang ◽  
Peng Zhou

2020 ◽  
Vol 3 (2) ◽  
pp. 106-112 ◽  
Author(s):  
Xiong Xiong ◽  
Mingqiang Huang ◽  
Ben Hu ◽  
Xuefei Li ◽  
Fei Liu ◽  
...  

2019 ◽  
Vol 21 (46) ◽  
pp. 25788-25796 ◽  
Author(s):  
Sushant Kumar Behera ◽  
Mayuri Bora ◽  
Sapta Sindhu Paul Chowdhury ◽  
Pritam Deb

Schematic of the magnetic proximity effect in a van der Waals heterostructure formed by a graphene monolayer, induced by its interaction with a two-dimensional ferromagnet (CrBr3) for designing a single-gate field effect transistor.


2021 ◽  
Vol 5 (1) ◽  
Author(s):  
Aryan Afzalian

AbstractUsing accurate dissipative DFT-NEGF atomistic-simulation techniques within the Wannier-Function formalism, we give a fresh look at the possibility of sub-10-nm scaling for high-performance complementary metal oxide semiconductor (CMOS) applications. We show that a combination of good electrostatic control together with high mobility is paramount to meet the stringent roadmap targets. Such requirements typically play against each other at sub-10-nm gate length for MOS transistors made of conventional semiconductor materials like Si, Ge, or III–V and dimensional scaling is expected to end ~12 nm gate-length (pitch of 40 nm). We demonstrate that using alternative 2D channel materials, such as the less-explored HfS2 or ZrS2, high-drive current down to ~6 nm is, however, achievable. We also propose a dynamically doped field-effect transistor concept, that scales better than its MOSFET counterpart. Used in combination with a high-mobility material such as HfS2, it allows for keeping the stringent high-performance CMOS on current and competitive energy-delay performance, when scaling down to virtually 0 nm gate length using a single-gate architecture and an ultra-compact design (pitch of 22 nm). The dynamically doped field-effect transistor further addresses the grand-challenge of doping in ultra-scaled devices and 2D materials in particular.


2021 ◽  
Author(s):  
Dongha Shin ◽  
Hwa Rang Kim ◽  
Byung Hee Hong

Since of its first discovery, graphene has attracted much attention because of the unique electrical transport properties that can be applied to high-performance field-effect transistor (FET). However, mounting chemical functionalities...


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