Intergrain Diffusion of Carbon Radical for Wafer-Scale, Direct Growth of Graphene on Silicon-Based Dielectrics

2018 ◽  
Vol 10 (31) ◽  
pp. 26517-26525 ◽  
Author(s):  
Phong Nguyen ◽  
Sanjay K. Behura ◽  
Michael R. Seacrist ◽  
Vikas Berry
Keyword(s):  
Wafer Scale ◽  
Direct Growth ◽  
Silicon Based

Direct Growth of Wafer-Scale, Transparent, p-Type Reduced-Graphene-Oxide-like Thin Films by Pulsed Laser Deposition

ACS Nano ◽  
2020 ◽  
Vol 14 (3) ◽  
pp. 3290-3298
Author(s):  
M. M. Juvaid ◽  
Soumya Sarkar ◽  
Pranjal Kumar Gogoi ◽  
Siddhartha Ghosh ◽  
Meenakshi Annamalai ◽  
...  
Keyword(s):  
Thin Films ◽  
Graphene Oxide ◽  
Pulsed Laser Deposition ◽  
Reduced Graphene Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Wafer Scale ◽  
Reduced Graphene ◽  
Direct Growth ◽  
P Type

Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition

2016 ◽  
Vol 365 ◽  
pp. 160-165 ◽  
Author(s):  
Yujin Jang ◽  
Seungmin Yeo ◽  
Han-Bo-Ram Lee ◽  
Hyungjun Kim ◽  
Soo-Hyun Kim
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Wafer Scale ◽  
Layer Deposition ◽  
Direct Growth

Wafer Scale Formation of Monocrystalline Silicon-Based Mie ResonatorsviaSilicon-on-Insulator Dewetting

ACS Nano ◽  
2014 ◽  
Vol 8 (11) ◽  
pp. 11181-11190 ◽  
Author(s):  
Marco Abbarchi ◽  
Meher Naffouti ◽  
Benjamin Vial ◽  
Abdelmalek Benkouider ◽  
Laurent Lermusiaux ◽  
...  
Keyword(s):  
Scale Formation ◽  
Monocrystalline Silicon ◽  
Wafer Scale ◽  
Silicon Based

scholarly journals Direct growth of wafer-scale highly oriented graphene on sapphire

2021 ◽  
Vol 7 (47) ◽  
Author(s):  
Zhaolong Chen ◽  
Chunyu Xie ◽  
Wendong Wang ◽  
Jinpei Zhao ◽  
Bingyao Liu ◽  
...  
Keyword(s):  
Wafer Scale ◽  
Direct Growth

Frequency stability of wafer-scale film encapsulated silicon based MEMS resonators

2007 ◽  
Vol 136 (1) ◽  
pp. 125-131 ◽  
Author(s):  
Bongsang Kim ◽  
Rob N. Candler ◽  
Matthew A. Hopcroft ◽  
Manu Agarwal ◽  
Woo-Tae Park ◽  
...  
Keyword(s):  
Frequency Stability ◽  
Wafer Scale ◽  
Mems Resonators ◽  
Silicon Based

scholarly journals Controlled crack propagation for atomic precision handling of wafer-scale two-dimensional materials

Science ◽  
2018 ◽  
Vol 362 (6415) ◽  
pp. 665-670 ◽  
Author(s):  
Jaewoo Shim ◽  
Sang-Hoon Bae ◽  
Wei Kong ◽  
Doyoon Lee ◽  
Kuan Qiao ◽  
...  
Keyword(s):  
Field Effect Transistors ◽  
Hexagonal Boron Nitride ◽  
2D Materials ◽  
Electronic Conductivity ◽  
Single Atom ◽  
Adhesive Tape ◽  
Two Dimensional ◽  
Wafer Scale ◽  
Splitting Technique ◽  
Direct Growth

Although flakes of two-dimensional (2D) heterostructures at the micrometer scale can be formed with adhesive-tape exfoliation methods, isolation of 2D flakes into monolayers is extremely time consuming because it is a trial-and-error process. Controlling the number of 2D layers through direct growth also presents difficulty because of the high nucleation barrier on 2D materials. We demonstrate a layer-resolved 2D material splitting technique that permits high-throughput production of multiple monolayers of wafer-scale (5-centimeter diameter) 2D materials by splitting single stacks of thick 2D materials grown on a single wafer. Wafer-scale uniformity of hexagonal boron nitride, tungsten disulfide, tungsten diselenide, molybdenum disulfide, and molybdenum diselenide monolayers was verified by photoluminescence response and by substantial retention of electronic conductivity. We fabricated wafer-scale van der Waals heterostructures, including field-effect transistors, with single-atom thickness resolution.

Wafer scale integration

1988 ◽  
Vol 135 (6) ◽  
pp. 281
Author(s):  
J.B. Butcher ◽  
K.K. Johnstone
Keyword(s):  
Wafer Scale ◽  
Wafer Scale Integration ◽  
Scale Integration

Deposition of ternary silicon based compounds by CVD techniques

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-101-Pr8-107
Author(s):  
F. J. Martí ◽  
A. Castro ◽  
J. Olivares ◽  
C. Gómez-Aleixandre ◽  
J. M. Albella
Keyword(s):  
Silicon Based

CVD mullite and mullite-alumina corrosion protection coatings for silicon based ceramics

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-861-Pr3-867 ◽  
Author(s):  
S. M. Zemskova ◽  
J. A. Haynes ◽  
K. M. Cooley
Keyword(s):  
Corrosion Protection ◽  
Silicon Based
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