Two-Step Chemical Vapor Deposition-Synthesized Lead-Free All-Inorganic Cs3Sb2Br9 Perovskite Microplates for Optoelectronic Applications

2021 ◽  
Author(s):  
Sujit Kumer Shil ◽  
Fei Wang ◽  
Kingsley O. Egbo ◽  
Zhengxun Lai ◽  
Ying Wang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Lead Free ◽  
Optoelectronic Applications

Engineering Chemical Vapor Deposition for Lead‐Free Perovskite‐Inspired MA 3 Bi 2 I 9 Self‐Powered Photodetectors with High Performance and Stability

2021 ◽  
pp. 2100192
Author(s):  
Van‐Hoang Vuong ◽  
S. V. N. Pammi ◽  
Kedhareswara Sairam Pasupuleti ◽  
Weiguang Hu ◽  
Van Dang Tran ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Performance ◽  
Chemical Vapor ◽  
Lead Free ◽  
Self Powered

Metalorganic chemical vapor deposition of lead-free ferroelectric BiFeO3 films for memory applications

2005 ◽  
Vol 87 (10) ◽  
pp. 102903 ◽  
Author(s):  
S. Y. Yang ◽  
F. Zavaliche ◽  
L. Mohaddes-Ardabili ◽  
V. Vaithyanathan ◽  
D. G. Schlom ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Lead Free ◽  
Memory Applications ◽  
Metalorganic Chemical

Characterization of plasma-assisted CVD multilayers/heterostructures

1991 ◽  
Vol 49 ◽  
pp. 804-805
Author(s):  
M.G. Burke ◽  
R.M. Young ◽  
C.B. Freidhoff ◽  
W.D. Partlow ◽  
H. Buhay
Keyword(s):  
Thermal Conductivity ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Optical Bandgap ◽  
High Thermal Conductivity ◽  
Multilayer Structures ◽  
Refractory Materials ◽  
Optoelectronic Applications

Amorphous refractory materials can be used in a number of optoelectronic applications when fabricated in multilayer structures. When the layers are deposited with very small thicknesses, heterostructures are produced. Such structures have an adjustable optical bandgap because the wavelength of light is much larger than the distance over which the composition of the film varies (layer to layer). Thicker multilayer structures can be fabricated on metallized, high thermal conductivity substrates. The purpose of the structure is to both protect and modify the substrate's properties. Two types of plasma-assisted chemical vapor deposition (PACVD) techniques have been employed to produce these structures.

Synthesis and Electrical Properties of (Bi1/2Na1/2)TiO3(BNT) Ferroelectric Thin Films by Liquid Sprayed Mist Chemical Vapor Deposition Technique

2006 ◽  
Vol 6 (11) ◽  
pp. 3479-3482
Author(s):  
Bok-Hee Kim ◽  
Sang-Hee Kim ◽  
Jong-Hwan Kim ◽  
Kun-Jae Lee ◽  
Yong-Ho Choa ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Deposition Temperature ◽  
Chemical Vapor ◽  
Precursor Solution ◽  
Ferroelectric Material ◽  
Lead Free ◽  
Deposition Technique ◽  
Vapor Deposition Technique

This study aims to synthesize lead-free ferroelectric material, (Bi1/2Na1/2)TiO3 using the Liquid Sprayed Mist Chemical Vapor Deposition (LSMCVD) technique. The mist of precursor solution was vaporized and deposited on two different substrates of Si(100) and (111)Pt/TiO2/SiO2/Si(100) in an oxygen atmosphere. The deposition temperature and time were varied in the range of 400–600 °C and 30–90 min. (Bi1/2Na1/2TiO3 thin film had preferred orientations of (110). The thickness of the thin film deposited was 35–162 nm. The remnant polarization (2Pr) and the dielectric constant were 4.6–16.8 μC/cm2, 325–350, respectively.

scholarly journals SiGeSn growth studies using reduced pressure chemical vapor deposition towards optoelectronic applications

2014 ◽  
Vol 557 ◽  
pp. 183-187 ◽  
Author(s):  
S. Wirths ◽  
D. Buca ◽  
Z. Ikonic ◽  
P. Harrison ◽  
A.T. Tiedemann ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Reduced Pressure ◽  
Growth Studies ◽  
Pressure Chemical ◽  
Optoelectronic Applications
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