Controlled Growth of Palladium Nanoparticles on Graphene Nanoplatelets via Scalable Atmospheric Pressure Atomic Layer Deposition

Hao Van Bui; Fabio Grillo; Ryan Helmer; Aristeidis Goulas; J. Ruud van Ommen

doi:10.1021/acs.jpcc.6b02285

Controlled Growth of Palladium Nanoparticles on Graphene Nanoplatelets via Scalable Atmospheric Pressure Atomic Layer Deposition

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.6b02285 ◽

2016 ◽

Vol 120 (16) ◽

pp. 8832-8840 ◽

Cited By ~ 11

Author(s):

Hao Van Bui ◽

Fabio Grillo ◽

Ryan Helmer ◽

Aristeidis Goulas ◽

J. Ruud van Ommen

Keyword(s):

Atomic Layer Deposition ◽

Atmospheric Pressure ◽

Palladium Nanoparticles ◽

Atomic Layer ◽

Graphene Nanoplatelets ◽

Controlled Growth ◽

Layer Deposition

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Retraction of “Controlled Growth of Palladium Nanoparticles on Graphene Nanoplatelets via Scalable Atmospheric Pressure Atomic Layer Deposition”

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.8b02883 ◽

2018 ◽

Vol 122 (16) ◽

pp. 9256-9256

Author(s):

Hao Van Bui ◽

Fabio Grillo ◽

Ryan Helmer ◽

Aristeidis Goulas ◽

J. Ruud van Ommen

Keyword(s):

Atomic Layer Deposition ◽

Atmospheric Pressure ◽

Palladium Nanoparticles ◽

Atomic Layer ◽

Graphene Nanoplatelets ◽

Controlled Growth ◽

Layer Deposition

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Controlled growth of ultrasmall Cu2O clusters on TiO2 nanoparticles by atmospheric-pressure atomic layer deposition for enhanced photocatalytic activity

Nanotechnology ◽

10.1088/1361-6528/ac10e2 ◽

2021 ◽

Author(s):

Dominik Benz ◽

Y-Nhi T. Nguyen ◽

Thanh-Lieu T. Le ◽

Thanh-Hiep T. Le ◽

Viet-Thong Le ◽

...

Keyword(s):

Photocatalytic Activity ◽

Atomic Layer Deposition ◽

Tio2 Nanoparticles ◽

Atmospheric Pressure ◽

Atomic Layer ◽

Controlled Growth ◽

Layer Deposition

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Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition

Chemical Vapor Deposition ◽

10.1002/cvde.200906775 ◽

2009 ◽

Vol 15 (7-9) ◽

pp. 227-233 ◽

Cited By ~ 58

Author(s):

Renske Beetstra ◽

Ugo Lafont ◽

John Nijenhuis ◽

Erik M. Kelder ◽

J. Ruud van Ommen

Keyword(s):

Atomic Layer Deposition ◽

Atmospheric Pressure ◽

Atomic Layer ◽

Layer Deposition

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Tuning the photocatalytic activity of TiO2 nanoparticles by ultrathin SiO2 films grown by low-temperature atmospheric pressure atomic layer deposition

Applied Surface Science ◽

10.1016/j.apsusc.2020.147244 ◽

2020 ◽

Vol 530 ◽

pp. 147244 ◽

Cited By ~ 5

Author(s):

Jing Guo ◽

Dominik Benz ◽

Thao-Trang Doan Nguyen ◽

Phuc-Huy Nguyen ◽

Thanh-Lieu Thi Le ◽

...

Keyword(s):

Photocatalytic Activity ◽

Low Temperature ◽

Atomic Layer Deposition ◽

Tio2 Nanoparticles ◽

Atmospheric Pressure ◽

Atomic Layer ◽

Sio2 Films ◽

Layer Deposition

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TiO 2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer

Plasma Processes and Polymers ◽

10.1002/ppap.201900127 ◽

2019 ◽

Vol 16 (12) ◽

pp. 1900127 ◽

Cited By ~ 6

Author(s):

Morteza Aghaee ◽

Joerie Verheyen ◽

Alquin A. E. Stevens ◽

Wilhelmus M. M. Kessels ◽

Mariadriana Creatore

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Atomic Layer Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Atomic Layer ◽

Layer Deposition

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Atmospheric pressure spatial atomic layer deposition web coating within situmonitoring of film thickness

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4850176 ◽

2014 ◽

Vol 32 (1) ◽

pp. 01A130 ◽

Cited By ~ 27

Author(s):

Alexander S. Yersak ◽

Yung C. Lee ◽

Joseph A. Spencer ◽

Markus D. Groner

Keyword(s):

Atomic Layer Deposition ◽

Film Thickness ◽

Atmospheric Pressure ◽

Atomic Layer ◽

Layer Deposition

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Controlled Growth of TaN, Ta3N5, and TaOxNyThin Films by Atomic Layer Deposition

Chemistry of Materials ◽

10.1021/cm980760x ◽

1999 ◽

Vol 11 (7) ◽

pp. 1712-1718 ◽

Cited By ~ 143

Author(s):

Mikko Ritala ◽

Pia Kalsi ◽

Diana Riihelä ◽

Kaupo Kukli ◽

Markku Leskelä ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Controlled Growth ◽

Layer Deposition

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Spatial Atmospheric Pressure Atomic Layer Deposition of Tin Oxide as an Impermeable Electron Extraction Layer for Perovskite Solar Cells with Enhanced Thermal Stability

ACS Applied Materials & Interfaces ◽

10.1021/acsami.7b17701 ◽

2018 ◽

Vol 10 (6) ◽

pp. 6006-6013 ◽

Cited By ~ 37

Author(s):

Lukas Hoffmann ◽

Kai O. Brinkmann ◽

Jessica Malerczyk ◽

Detlef Rogalla ◽

Tim Becker ◽

...

Keyword(s):

Thermal Stability ◽

Solar Cells ◽

Atomic Layer Deposition ◽

Tin Oxide ◽

Atmospheric Pressure ◽

Perovskite Solar Cells ◽

Atomic Layer ◽

Layer Deposition ◽

Electron Extraction

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Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5006781 ◽

2018 ◽

Vol 36 (1) ◽

pp. 01A112 ◽

Cited By ~ 16

Author(s):

Lukas Hoffmann ◽

Detlef Theirich ◽

Daniel Schlamm ◽

Tim Hasselmann ◽

Sven Pack ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Diffusion Barrier ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Atomic Layer ◽

Gas Diffusion ◽

Pressure Plasma ◽

Layer Deposition

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A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

Chemical Communications ◽

10.1039/d0cc05781a ◽

2020 ◽

Vol 56 (89) ◽

pp. 13752-13755

Author(s):

Nils Boysen ◽

Bujamin Misimi ◽

Arbresha Muriqi ◽

Jan-Lucas Wree ◽

Tim Hasselmann ◽

...

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Atmospheric Pressure ◽

Atomic Layer ◽

First Report ◽

Layer Deposition

This is the first report on a plasma enhanced spatial atomic layer deposition (APP-ALD) process at atmospheric pressure to grow conducting metallic Cu thin films from a carbene stabilized precursor.

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