scholarly journals Odd–Even Effect in Electron Beam Irradiation of Hybrid Aromatic–Aliphatic Self-Assembled Monolayers of Fatty Acid

2021 ◽  
Author(s):  
Monika Kruk ◽  
Christof Neumann ◽  
Martha Frey ◽  
Krzysztof Kozieł ◽  
Andrey Turchanin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Fatty Acid ◽  
Electron Beam Irradiation ◽  
Self Assembled Monolayers ◽  
Beam Irradiation ◽  
Assembled Monolayers ◽  
Self Assembled

Effect of electron beam irradiation on phytochemical composition, lipase activity and fatty acid of quinoa

2021 ◽  
Vol 98 ◽  
pp. 103161
Author(s):  
Xiaohu Luo ◽  
Zhihong Du ◽  
Kai Yang ◽  
Jing Wang ◽  
Jing Zhou ◽  
...  
Keyword(s):  
Electron Beam ◽  
Fatty Acid ◽  
Lipase Activity ◽  
Electron Beam Irradiation ◽  
Beam Irradiation ◽  
Phytochemical Composition

Electron-Beam-Induced Damage in Self-Assembled Monolayers

1996 ◽  
Vol 100 (39) ◽  
pp. 15900-15909 ◽  
Author(s):  
Kannan Seshadri ◽  
Karl Froyd ◽  
Atul N. Parikh ◽  
David L. Allara ◽  
Michael J. Lercel ◽  
...  
Keyword(s):  
Electron Beam ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

1995 ◽  
Vol 27 (1-4) ◽  
pp. 43-46 ◽  
Author(s):  
M.J. Lercel ◽  
G.F. Redinbo ◽  
M. Rooks ◽  
R.C. Tiberio ◽  
H.G. Craighead ◽  
...  
Keyword(s):  
Electron Beam ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Self-Assembled Monolayers as High-Resolution Etch Masks and Templates for Organic Molecular Assembly

2000 ◽  
Vol 636 ◽  
Author(s):  
C. K. Harnett ◽  
A. G. Lopez ◽  
K. M. Satyalakshmi ◽  
Y.-F. Chen ◽  
H. G. Craighead
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Molecular Assembly ◽  
Single Step ◽  
Self Assembled Monolayers ◽  
Organic Chemical ◽  
Organic Systems ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Electron Beam Patterning

AbstractWe have used a variety of self-assembled monolayers as resists for low energy electron beam patterning. These compounds can be used as high-resolution patternable linker molecules for selected area binding of proteins and other organic compounds, as well as nanoparticles with organic chemical coatings. Because these systems can be aligned in registry to existing patterns, the organic systems may be positioned with the accuracy of electron-beam lithography. We have also explored the use of self-assembled monolayers for the creation of sub-wavelength artificial dielectric systems. The ultra-thin patterned monolayer is combined with a contrast-enhancing etch process to create high aspect ratio structures. This technique can be used to fabricate diffractive optical devices in a single-step process.

Nanoscale Patterning of Protein Using Electron Beam Lithography of Organosilane Self-Assembled Monolayers

Small ◽  
2005 ◽  
Vol 1 (8-9) ◽  
pp. 833-837 ◽  
Author(s):  
Guo-Jun Zhang ◽  
Takashi Tanii ◽  
Tamotsu Zako ◽  
Takumi Hosaka ◽  
Takeo Miyake ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Self Assembled Monolayers ◽  
Nanoscale Patterning ◽  
Assembled Monolayers ◽  
Self Assembled

scholarly journals Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

2012 ◽  
Vol 3 ◽  
pp. 101-113 ◽  
Author(s):  
Zhe She ◽  
Andrea DiFalco ◽  
Georg Hähner ◽  
Manfred Buck
Keyword(s):  
Electron Beam ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Metal Structures ◽  
Step Procedure ◽  
Assembled Monolayers ◽  
Polycrystalline Gold ◽  
Self Assembled ◽  
Lift Off ◽  
Surface Morphologies

Self-assembled monolayers (SAMs) of 4'-methylbiphenyl-4-thiol (MBP0) adsorbed on polycrystalline gold substrates served as templates to control electrochemical deposition of Cu structures from acidic solution, and enabled the subsequent lift-off of the metal structures by attachment to epoxy glue. By exploiting the negative-resist behaviour of MBP0, the SAM was patterned by means of electron-beam lithography. For high deposition contrast a two-step procedure was employed involving a nucleation phase around −0.7 V versus Cu2+/Cu and a growth phase at around −0.35 V versus Cu2+/Cu. Structures with features down to 100 nm were deposited and transferred with high fidelity. By using substrates with different surface morphologies, AFM measurements revealed that the roughness of the substrate is a crucial factor but not the only one determining the roughness of the copper surface that is exposed after lift-off.

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