Surface roughness of hydrogen silsesquioxane as a negative tone electron beam resist

Vacuum ◽  
2005 ◽  
Vol 77 (2) ◽  
pp. 117-123 ◽  
Author(s):  
Y.M. Georgiev ◽  
W. Henschel ◽  
A. Fuchs ◽  
H. Kurz
Keyword(s):  
Surface Roughness ◽  
Electron Beam ◽  
Hydrogen Silsesquioxane ◽  
Negative Tone

Nanostructuring Techniques for 3C-SiC(100) NEMS Structures

2010 ◽  
Vol 645-648 ◽  
pp. 841-844 ◽  
Author(s):  
Manuel Hofer ◽  
Thomas Stauden ◽  
Ivo W. Rangelow ◽  
Jörg Pezoldt
Keyword(s):  
Electron Beam ◽  
Crystallographic Orientation ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Dry Etching ◽  
Hydrogen Silsesquioxane ◽  
Free Standing ◽  
Feature Size ◽  
Etching Mask ◽  
Negative Tone

In this work nanostructures based on a 30 nm thick 3C-SiC (100) heteroepitaxially grown on Si(100) are demonstrated. They consist of free standing nanoresonators with dimensions below 50 nm. The free standing nanostructures and resonators were defined by electron beam lithography using hydrogen silsesquioxane (HSQ) as a negative tone e-beam resist acting as a selective etching mask during the anisotropic and isotropic dry etching. The influences of the proximity effect, the crystallographic orientation, the angle of exposing on the feature size are highlighted.

scholarly journals Directionally-Dependent Mechanical Properties of Ti6Al4V Manufactured by Electron Beam Melting (EBM) and Selective Laser Melting (SLM)

Materials ◽  
2021 ◽  
Vol 14 (13) ◽  
pp. 3603
Author(s):  
Tim Pasang ◽  
Benny Tavlovich ◽  
Omry Yannay ◽  
Ben Jakson ◽  
Mike Fry ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Surface Roughness ◽  
Tensile Strength ◽  
Electron Beam ◽  
Additive Manufacturing ◽  
Selective Laser Melting ◽  
Electron Beam Melting ◽  
Rolling Direction ◽  
Laser Melting ◽  
Plate Rolling

An investigation of mechanical properties of Ti6Al4V produced by additive manufacturing (AM) in the as-printed condition have been conducted and compared with wrought alloys. The AM samples were built by Selective Laser Melting (SLM) and Electron Beam Melting (EBM) in 0°, 45° and 90°—relative to horizontal direction. Similarly, the wrought samples were also cut and tested in the same directions relative to the plate rolling direction. The microstructures of the samples were significantly different on all samples. α′ martensite was observed on the SLM, acicular α on EBM and combination of both on the wrought alloy. EBM samples had higher surface roughness (Ra) compared with both SLM and wrought alloy. SLM samples were comparatively harder than wrought alloy and EBM. Tensile strength of the wrought alloy was higher in all directions except for 45°, where SLM samples showed higher strength than both EBM and wrought alloy on that direction. The ductility of the wrought alloy was consistently higher than both SLM and EBM indicated by clear necking feature on the wrought alloy samples. Dimples were observed on all fracture surfaces.

In Situ Thin Film Stress Measurements – A Path to Understanding the Structure and Morphology of Electron Beam Evaporated ZnS

2002 ◽  
Vol 749 ◽  
Author(s):  
Vincent Barrioz ◽  
Stuart J. C. Irvine ◽  
D. Paul
Keyword(s):  
Residual Stress ◽  
Surface Roughness ◽  
Electron Beam ◽  
Stress Reduction ◽  
Float Glass ◽  
Film Stress ◽  
Intrinsic Stress ◽  
Ex Situ ◽  
Stress Measurements

ABSTRACTZnS is a material of choice in the optical coating industry for its optical properties and broad transparency range. One of the drawbacks of ZnS is that it develops high compressive intrinsic stress resulting in large residual stress in the deposited layer. This paper concentrates on the evolution of residual stress reduction in ZnS single layers, depending upon their deposition rate or the substrate temperature during deposition (i.e. 22 °C and 133 °C). The substrate preparation is addressed for consideration of layer adhesion. Residual stress of up to − 550 MPa has been observed in amorphous/poor polycrystalline ZnS layers, deposited on CMX and Float glass type substrates, by electron beam evaporation at 22 °C, with a surface roughness between 0.4 and 0.8 nm. At 133 °C, the layer had a surface roughness of 1 nm, the residual stress in the layer decreased to − 150 MPa, developing a wurtzite structure with a (002) preferred orientation. In situ stress measurements, using a novel optical approach with a laser-fibre system, were carried out to identify the various sources of stress. A description of this novel in situ stress monitor and its advantages are outlined. The residual stress values were supported by two ex situ stress techniques. The surface morphology analysis of the ZnS layers was carried out using an atomic force microscope (AFM), and showed that stress reduced layers actually gave rougher surfaces.

Systematic Studies of Fullerene Derivative Electron Beam Resists

1999 ◽  
Vol 584 ◽  
Author(s):  
A. P. G. Robinson ◽  
R. E. Palmer ◽  
T. Tada ◽  
T. Kanayama ◽  
E. J. Shelley ◽  
...  
Keyword(s):  
Electron Beam ◽  
Dissolution Rate ◽  
Organic Solvents ◽  
Spin Coating ◽  
Electron Beam Irradiation ◽  
Fullerene Derivative ◽  
Silicon Substrates ◽  
Beam Irradiation ◽  
Negative Tone ◽  
20 Nm

AbstractWe report systematic studies of the response of C60 derivatives to electron beam irradiation. Films of fourteen different mono, tris and tetra adduct methanofullerene C60 derivatives were produced by spin coating on hydrogen terminated silicon substrates. Exposure of the films to a 20 keV electron beam substantially altered the dissolution rate of the derivative films in organic solvents such as monochlorobenzene. All of the derivatives exhibited negative tone resist behaviour with sensitivities between ∼ 8.5 × 10-4 and ∼ 4 × 10-3 C/cm2 107, much higher than that of C60. Features with widths of ∼ 20 nm were produced using these compounds, and the etch ratios of the compounds were found to be more than twice those of a standard novolac based resist (SAL601).

Influence of Electron Beam Pulsed Times on the Properties of 40Cr

2010 ◽  
Vol 154-155 ◽  
pp. 1170-1177
Author(s):  
Yuan Fang Chen ◽  
Xiao Dong Peng ◽  
Jian Jun Hu ◽  
Hong Bin Xu ◽  
Chan Hao
Keyword(s):  
Surface Roughness ◽  
Wear Resistance ◽  
Corrosion Resistance ◽  
Electron Beam ◽  
High Current ◽  
Wear Properties ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Surface Microstructures ◽  
40Cr Steel

Surface modification of 40Cr steel by high current pulsed electron beam has been investigated . The pulsed times of HCPEB was changed from 1 to 25 to prepare different specimens. Surface microstructures and section microstructures after HCPEB irradiation were detected by using metallurgical microscope, SEM and X-ray diffractometer. It is shown that crater defects were found on the surface after the irradiation of HCPEB and the density of craters will decrease with increasing pulses times. When treated by 27Kev accelerating voltage, with increasing pulse times, the particles located in surface layer were obviously refined .The surface roughness, hardness, wear properties and corrosion resistance were analyzed after irradiation of HCPEB. The wear resistance and corrosion resistance were obviously enhanced after 10 pulses treatment.

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