Effect of post-annealing treatment in oxygen on dielectric properties of K0.5Na0.5NbO3 thin films prepared by chemical solution deposition

2011 ◽  
Vol 519 (15) ◽  
pp. 5070-5073 ◽  
Author(s):  
N. Li ◽  
W.L. Li ◽  
S.Q. Zhang ◽  
W.D. Fei
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Chemical Solution Deposition ◽  
Annealing Treatment ◽  
Chemical Solution ◽  
Solution Deposition ◽  
Post Annealing

scholarly journals Ferroelectric and dielectric properties of Ca2+-doped and Ca2+–Ti4+ co-doped K0.5Na0.5NbO3 thin films

2020 ◽  
Vol 8 (15) ◽  
pp. 5102-5111
Author(s):  
Nikolai Helth Gaukås ◽  
Julia Glaum ◽  
Mari-Ann Einarsrud ◽  
Tor Grande
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Chemical Solution Deposition ◽  
Chemical Solution ◽  
Solution Deposition ◽  
Si Substrates ◽  
Co Doped

Doped K0.5Na0.5NbO3 films with good ferroelectric and dielectric properties were prepared by aqueous chemical solution deposition on platinized Si substrates.

Orientation-controlled BaTiO3 thin films fabricated by chemical solution deposition

RSC Advances ◽  
2015 ◽  
Vol 5 (118) ◽  
pp. 97563-97567 ◽  
Author(s):  
Tadasu Hosokura ◽  
Akira Ando ◽  
Takehiro Konoike
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Chemical Solution Deposition ◽  
Chemical Solution ◽  
Solution Deposition

We synthesized orientation-controlled (100), (110), and (111) BaTiO3 films by the CSD method and revealed the dielectric properties the films.

Dielectric properties of Ca(Zr0.05Ti0.95)O3 thin films prepared by chemical solution deposition

2006 ◽  
Vol 179 (12) ◽  
pp. 3739-3743 ◽  
Author(s):  
L.S. Cavalcante ◽  
A.Z. Simões ◽  
L.P.S. Santos ◽  
M.R.M.C. Santos ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Chemical Solution Deposition ◽  
Chemical Solution ◽  
Solution Deposition
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