Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition

2011 ◽  
Vol 519 (15) ◽  
pp. 4981-4986 ◽  
Author(s):  
Maisara Othman ◽  
Richard Ritikos ◽  
Noor Hamizah Khanis ◽  
Nur Maisarah Abdul Rashid ◽  
Saadah Abdul Rahman ◽  
...  
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Chemical Vapour Deposition ◽  
Carbon Nitride ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Rf Power

scholarly journals Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition

2017 ◽  
Vol 17 (6) ◽  
pp. 306-314
Author(s):  
Paul Kouakou ◽  
Pamela Yoboue ◽  
Bafetigue Ouattara ◽  
Mohammed Belmahi ◽  
Jamal Bougdira
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Carbon Nitride ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Silicon Carbon ◽  
Silicon Carbon Nitride

Electrical and structural properties of p-type ZnO:N thin films prepared by plasma enhanced chemical vapour deposition

2005 ◽  
Vol 20 (8) ◽  
pp. 796-800 ◽  
Author(s):  
Zhiyan Xiao ◽  
Yichun Liu ◽  
Jiying Zhang ◽  
Dongxu Zhao ◽  
Youming Lu ◽  
...  
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
P Type

Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition

2000 ◽  
Vol 125 (1-3) ◽  
pp. 301-307 ◽  
Author(s):  
A. Crunteanu ◽  
M. Charbonnier ◽  
M. Romand ◽  
F. Vasiliu ◽  
D. Pantelica ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Carbon Nitride ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Synthesis And Characterization

Structural properties of BN thin films obtained by plasma-enhanced chemical vapour deposition

1994 ◽  
Vol 21 (11) ◽  
pp. 809-813 ◽  
Author(s):  
I. Montero ◽  
L. Galán ◽  
S. P. Osòrio ◽  
J. M. Martínez-Duart ◽  
J. Perrière
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour

scholarly journals Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)

RSC Advances ◽  
2021 ◽  
Vol 11 (36) ◽  
pp. 22199-22205
Author(s):  
Rachel L. Wilson ◽  
Thomas J. Macdonald ◽  
Chieh-Ting Lin ◽  
Shengda Xu ◽  
Alaric Taylor ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hole Transport ◽  
Blocking Layer ◽  
The Novel ◽  
Electron Blocking Layer

We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.

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