(Pb,Sr)TiO3 thin films etching characteristics using inductively coupled plasma

Thin Solid Films ◽

10.1016/j.tsf.2003.09.007 ◽

2004 ◽

Vol 447-448 ◽

pp. 688-692 ◽

Cited By ~ 2

Author(s):

Gwan-Ha Kim ◽

Kyoung-Tae Kim ◽

Dong-Pyo Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Evolution of nanocrystalline diamond thin films by high-density low-pressure CH4 plasma in planar inductively coupled plasma CVD

10.1063/5.0016897 ◽

2020 ◽

Author(s):

Sucharita Saha ◽

Debajyoti Das

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Low Pressure ◽

High Density ◽

Nanocrystalline Diamond ◽

Plasma Cvd ◽

Inductively Coupled ◽

Diamond Thin Films

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Thin Solid Films ◽

10.1016/j.tsf.2006.10.087 ◽

2007 ◽

Vol 515 (12) ◽

pp. 4955-4959 ◽

Cited By ~ 6

Author(s):

Gwan-Ha Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Buffer Layer ◽

Magnesium Oxide ◽

Inductively Coupled Plasma ◽

Dry Etching ◽

Oxide Thin Films ◽

Inductively Coupled ◽

Mfis Structure

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Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Vacuum ◽

10.1016/j.vacuum.2004.01.018 ◽

2004 ◽

Vol 74 (3-4) ◽

pp. 485-489 ◽

Cited By ~ 4

Author(s):

Gwan-Ha Kim ◽

Kyoung-Tae Kim ◽

Dong-Pyo Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Etching Mechanism

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Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Journal of Applied Physics ◽

10.1063/1.4807404 ◽

2013 ◽

Vol 113 (20) ◽

pp. 203505 ◽

Cited By ~ 5

Author(s):

Y. N. Guo ◽

D. Y. Wei ◽

S. Q. Xiao ◽

S. Y. Huang ◽

H. P. Zhou ◽

...

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films

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Etching mechanisms of (Ba,Sr)TiO3 thin films in CF4/Ar inductively coupled plasma

Microelectronic Engineering ◽

10.1016/j.mee.2003.09.001 ◽

2004 ◽

Vol 71 (1) ◽

pp. 54-62 ◽

Cited By ~ 12

Author(s):

A.M Efremov ◽

Dong-Pyo Kim ◽

Kyoung-Tae Kim ◽

Chang-Il Kim

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Nano-crystalline silicon thin films grown by the inductively coupled plasma assisted CFUBM at low temperature

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.07.086 ◽

2010 ◽

Vol 205 ◽

pp. S227-S230 ◽

Cited By ~ 6

Author(s):

Kyung S. Shin ◽

Yoon S. Choi ◽

In S. Choi ◽

Y. Setsuhara ◽

Jeon G. Han

Keyword(s):

Thin Films ◽

Low Temperature ◽

Inductively Coupled Plasma ◽

Crystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Nano Crystalline

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Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb05 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB05 ◽

Cited By ~ 4

Author(s):

Kosuke Takenaka ◽

Yuichi Setsuhara ◽

Akinori Ebe

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Controlled Deposition

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Etch characteristics of Bi4−xEuxTi3O12 (BET) thin films using inductively coupled plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1579011 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1475-1481

Author(s):

Kyu-Tae Lim ◽

Kyoung-Tae Kim ◽

Dong-Pyo Kim ◽

Chang-II Kim

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Reactive ion etching of Pb(Zr[sub x]Ti[sub 1−x])O[sub 3] thin films in an inductively coupled plasma

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590104 ◽

1998 ◽

Vol 16 (4) ◽

pp. 1894 ◽

Cited By ~ 43

Author(s):

Chee Won Chung

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Reactive Ion Etching ◽

Ion Etching ◽

Inductively Coupled

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