Room temperature deposition of homogeneous, highly transparent and conductive Al-doped ZnO films by reactive high power impulse magnetron sputtering
2016 ◽
Vol 157
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pp. 742-749
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2009 ◽
Vol 255
(11)
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pp. 5669-5673
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2010 ◽
Vol 312
(7)
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pp. 906-909
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2016 ◽
Vol 13
(10-12)
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pp. 951-957
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2009 ◽
Vol 246
(6)
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pp. 1243-1247
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2011 ◽
Vol 208
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pp. 1908-1912
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2017 ◽
Vol 28
(8)
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pp. 6093-6098
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