Dynamic reactive sputtering of photochromic yttrium hydride thin films

2015 ◽  
Vol 143 ◽  
pp. 623-626 ◽  
Author(s):  
Chang Chuan You ◽  
Trygve Mongstad ◽  
Jan Petter Maehlen ◽  
Smagul Karazhanov
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Yttrium Hydride

scholarly journals Transparent yttrium hydride thin films prepared by reactive sputtering

2011 ◽  
Vol 509 ◽  
pp. S812-S816 ◽  
Author(s):  
T. Mongstad ◽  
C. Platzer-Björkman ◽  
S.Zh. Karazhanov ◽  
A. Holt ◽  
J.P. Maehlen ◽  
...  
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Yttrium Hydride

Preparation of CdS Thin Films by Reactive Sputtering Method

Shinku ◽  
1974 ◽  
Vol 17 (1) ◽  
pp. 19-22 ◽  
Author(s):  
Hiroharu HIRABAYASHI ◽  
Minoru NOGAMI
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Cds Thin Films

Substrate bias effects during R-F sputtering of Y-Ba-Cu-O films

1990 ◽  
Vol 5 (4) ◽  
pp. 677-679 ◽  
Author(s):  
A. J. Drehman ◽  
M. W. Dumais
Keyword(s):  
Thin Films ◽  
Strontium Titanate ◽  
Reactive Sputtering ◽  
Negative Bias ◽  
Superconducting Thin Films ◽  
Substrate Bias ◽  
Composition Control ◽  
Zero Resistance

Y-Ba-Cu-O films were made by R-F diode sputtering using a single oxide target. It was found that if a small negative bias is applied to the substrate, the etching associated with reactive sputtering is significantly reduced. This results in better composition control and uniformity, which are quite important for the formation of superconducting thin films. Films deposited on strontium titanate, when annealed in oxygen, become superconducting with zero resistance at 89 K.

Evaluation of ion conductivity of ZrO2 thin films prepared by reactive sputtering in O2, H2O, and H2O+H2O2 mixed gas

2012 ◽  
Vol 520 (16) ◽  
pp. 5137-5140 ◽  
Author(s):  
Ning Li ◽  
Yoshio Abe ◽  
Midori Kawamura ◽  
Kyung Ho Kim ◽  
Tsutomu Suzuki
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Ion Conductivity ◽  
Mixed Gas

Peculiarities of nucleation of PbOx thin films during ion-beam reactive sputtering

1996 ◽  
Vol 153 (2) ◽  
pp. K1-K4
Author(s):  
E. V. Sviridov ◽  
D. Q. Xiao ◽  
W. B. Pezg ◽  
Z. Shi ◽  
J. G. Zhu
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Reactive Sputtering

scholarly journals Reactive Sputtering of Magnesium Hydride Thin Films for Photovoltaic Applications

2009 ◽  
Vol 1210 ◽  
Author(s):  
Charlotte Platzer-Björkman ◽  
Trygve Mongstad ◽  
Smagul Zh. Karazhanov ◽  
Jan-Petter Maehlen ◽  
Erik Stensrud Marstein ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Passivation ◽  
Hydrogen Plasma ◽  
Reactive Sputtering ◽  
X Ray Diffraction ◽  
High Hydrogen ◽  
Hydrogen Flow ◽  
Resistivity Measurements ◽  
Photovoltaic Applications ◽  
Silicon Surface Passivation

AbstractDeposition of MgHx (MgH2 + Mg) thin films is performed using RF reactive sputtering in argon-hydrogen plasma. Films are characterized using x-ray diffraction (XRD), scanning electron microscopy, optical and resistivity measurements. Formation of crystalline MgH2 is confirmed by XRD, but the formation of some metallic Mg in the films could not be avoided. Increased H/Mg ratio by deposition at high hydrogen flow or high total pressure gives films that oxidize within days or weeks. Deposition at elevated substrate temperature results in improved crystallinity and stability. Initial studies of MgHx for silicon surface passivation are presented.

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