Evaluation of ion conductivity of ZrO2 thin films prepared by reactive sputtering in O2, H2O, and H2O+H2O2 mixed gas

2012 ◽  
Vol 520 (16) ◽  
pp. 5137-5140 ◽  
Author(s):  
Ning Li ◽  
Yoshio Abe ◽  
Midori Kawamura ◽  
Kyung Ho Kim ◽  
Tsutomu Suzuki
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Ion Conductivity ◽  
Mixed Gas

Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2+ H2O Mixed Gas

2009 ◽  
Vol 48 (1) ◽  
pp. 015501 ◽  
Author(s):  
Hideaki Ueta ◽  
Yoshio Abe ◽  
Kiyohiko Kato ◽  
Midori Kawamura ◽  
Katsutaka Sasaki ◽  
...  
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Mixed Gas

Effects of substrate temperature on the ion conductivity of hydrated ZrO2 thin films prepared by reactive sputtering in H2O atmosphere

2012 ◽  
Vol 99 ◽  
pp. 160-165 ◽  
Author(s):  
Ning Li ◽  
Miki Suzuki ◽  
Yoshio Abe ◽  
Midori Kawamura ◽  
Katsutaka Sasaki ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Reactive Sputtering ◽  
Ion Conductivity

Preparation of CdS Thin Films by Reactive Sputtering Method

Shinku ◽  
1974 ◽  
Vol 17 (1) ◽  
pp. 19-22 ◽  
Author(s):  
Hiroharu HIRABAYASHI ◽  
Minoru NOGAMI
Keyword(s):  
Thin Films ◽  
Reactive Sputtering ◽  
Cds Thin Films

Substrate bias effects during R-F sputtering of Y-Ba-Cu-O films

1990 ◽  
Vol 5 (4) ◽  
pp. 677-679 ◽  
Author(s):  
A. J. Drehman ◽  
M. W. Dumais
Keyword(s):  
Thin Films ◽  
Strontium Titanate ◽  
Reactive Sputtering ◽  
Negative Bias ◽  
Superconducting Thin Films ◽  
Substrate Bias ◽  
Composition Control ◽  
Zero Resistance

Y-Ba-Cu-O films were made by R-F diode sputtering using a single oxide target. It was found that if a small negative bias is applied to the substrate, the etching associated with reactive sputtering is significantly reduced. This results in better composition control and uniformity, which are quite important for the formation of superconducting thin films. Films deposited on strontium titanate, when annealed in oxygen, become superconducting with zero resistance at 89 K.

Peculiarities of nucleation of PbOx thin films during ion-beam reactive sputtering

1996 ◽  
Vol 153 (2) ◽  
pp. K1-K4
Author(s):  
E. V. Sviridov ◽  
D. Q. Xiao ◽  
W. B. Pezg ◽  
Z. Shi ◽  
J. G. Zhu
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Reactive Sputtering
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