Structural study of device quality silicon germanium thin films deposited by pulsed RF plasma CVD

2009 ◽  
Vol 93 (6-7) ◽  
pp. 1016-1019 ◽  
Author(s):  
Partha Chaudhuri ◽  
Ayana Bhaduri ◽  
Atul Bandyopadhyay ◽  
D.L. Williamson
Keyword(s):  
Thin Films ◽  
Structural Study ◽  
Silicon Germanium ◽  
Rf Plasma ◽  
Plasma Cvd ◽  
Pulsed Rf

High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method

2008 ◽  
Vol 354 (19-25) ◽  
pp. 2105-2108 ◽  
Author(s):  
Partha Chaudhuri ◽  
Ayana Bhaduri ◽  
Atul Bandyopadhyay ◽  
Stephane Vignoli ◽  
Partha Pratim Ray ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Germanium ◽  
Diffusion Length ◽  
High Diffusion ◽  
Germanium Alloy ◽  
Pulsed Rf

Low-temperature Deposition of SiCN Thin Films by RF Plasma CVD Method

2014 ◽  
Vol 134 (10) ◽  
pp. 538-544
Author(s):  
Masahiko Kumadaki ◽  
Masaki Yoshino ◽  
Kohki Sato ◽  
Hidenori Itoh
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Rf Plasma ◽  
Plasma Cvd ◽  
Cvd Method ◽  
Low Temperature Deposition ◽  
Temperature Deposition ◽  
Sicn Thin Films

Diamond-like carbon thin films prepared by rf-plasma CVD

Vacuum ◽  
1991 ◽  
Vol 42 (16) ◽  
pp. 1058
Author(s):  
Jiang Jie ◽  
Liu Chenzan
Keyword(s):  
Thin Films ◽  
Rf Plasma ◽  
Diamond Like Carbon ◽  
Plasma Cvd ◽  
Carbon Thin Films

Formation of titanium silicide thin films on Si(100) substrate by RF plasma CVD

2003 ◽  
Vol 169-170 ◽  
pp. 632-635 ◽  
Author(s):  
O.A. Fouad ◽  
M. Yamazato ◽  
A. Hiroshi ◽  
M. Era ◽  
M. Nagano
Keyword(s):  
Thin Films ◽  
Titanium Silicide ◽  
Rf Plasma ◽  
Plasma Cvd
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