Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

2012 ◽  
Vol 188 ◽  
pp. 240-245 ◽  
Author(s):  
R.L. Puurunen ◽  
A. Häärä ◽  
H. Saloniemi ◽  
J. Dekker ◽  
M. Kainlauri ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Microelectromechanical Systems ◽  
Atomic Layer ◽  
Nanometer Scale ◽  
Layer Deposition

Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications

2016 ◽  
Vol 368 ◽  
pp. 470-476 ◽  
Author(s):  
Maria Berdova ◽  
Claudia Wiemer ◽  
Alessio Lamperti ◽  
Grazia Tallarida ◽  
Elena Cianci ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Microelectromechanical Systems ◽  
Protective Coatings ◽  
Atomic Layer ◽  
Hafnium Dioxide ◽  
Layer Deposition

Fabrication of Porous Al2O3 and TiO2 Thin Film Hybrid Composite Using Atomic Layer Deposition and Properties Study

2007 ◽  
Vol 124-126 ◽  
pp. 1273-1276
Author(s):  
S.J. Park ◽  
B.K. Ahn ◽  
Prashant Sudhir Alegaonkar ◽  
H.J. Shin ◽  
Ji Beom Yoo
Keyword(s):  
Atomic Layer Deposition ◽  
Anodic Oxidation ◽  
Porous Alumina ◽  
Atomic Layer ◽  
Narrow Channel ◽  
Thin Layers ◽  
Nanometer Scale ◽  
Interface Morphology ◽  
Layer Deposition ◽  
Titanium Dioxide Thin Films

Atomic layer deposition (ALD) has been used in advanced applications where thin layers of materials with precise thickness down to the nanometer scale are needed. Using anodic oxidation, we prepared the porous alumina. Anodic oxidation was carried out in 5C 0.3M oxalic acid with anodizing voltages (~ 40 V) and two step anodization method. SEM shows that, these porous anodic oxides are well aligned and organized into high-density uniform arrays. Afterward, titanium dioxide thin films were coated by ALD on the porous anodic aluminum oxide. ALD films were influenced by the deposited interface morphology between Al2O3 and TiO2 and narrow channel of ~ 10 nm was obtained by controlling ALD cycle.

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition
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