scholarly journals Effect of Sputtering Current on Structure and Morphology of (Ti1-xCrx)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering

2012 ◽  
Vol 32 ◽  
pp. 875-881 ◽  
Author(s):  
C. Paksunchai ◽  
S. Denchitcharoen ◽  
S. Chaiyakun ◽  
P. Limsuwan
Keyword(s):  
Thin Films ◽  
Structure And Morphology ◽  
Unbalanced Magnetron

Identification of nanoscale structure and morphology reconstruction in oxidized a-SiC:H thin films

2012 ◽  
Vol 260 ◽  
pp. 73-76 ◽  
Author(s):  
A.V. Vasin ◽  
A.V. Rusavsky ◽  
A.N. Nazarov ◽  
V.S. Lysenko ◽  
P.M. Lytvyn ◽  
...  
Keyword(s):  
Thin Films ◽  
Structure And Morphology ◽  
Nanoscale Structure

scholarly journals Hollow cathode magnetron deposition of AlN thin films: crystalline structure and morphology

2006 ◽  
Vol 36 (2a) ◽  
pp. 332-335 ◽  
Author(s):  
R. S. Pessoa ◽  
G. Murakami ◽  
G. Petraconi ◽  
H. S. Maciel ◽  
I. C. Oliveira ◽  
...  
Keyword(s):  
Thin Films ◽  
Crystalline Structure ◽  
Hollow Cathode ◽  
Magnetron Deposition ◽  
Structure And Morphology

scholarly journals Enhanced Magnetic Properties of BiFeO3 Thin Films by Doping: Analysis of Structure and Morphology

Nanomaterials ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 711 ◽  
Author(s):  
Yilin Zhang ◽  
Yuhan Wang ◽  
Ji Qi ◽  
Yu Tian ◽  
Mingjie Sun ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Sol Gel ◽  
Exchange Interactions ◽  
Ferromagnetic Behavior ◽  
Ferromagnetic Properties ◽  
Structure And Morphology ◽  
Related Diversification ◽  
Lattice Distortions ◽  
Mn Doped

The improvement of ferromagnetic properties is critical for the practical application of multiferroic materials, to be exact, BiFeO3 (BFO). Herein, we have investigated the evolution in the structure and morphology of Ho or/and Mn-doped thin films and the related diversification in ferromagnetic behavior. BFO, Bi0.95Ho0.05FeO3 (BHFO), BiFe0.95Mn0.05O3 (BFMO) and Bi0.95Ho0.05Fe0.95Mn0.05O3 (BHFMO) thin films are synthesized via the conventional sol-gel method. Density, size and phase structure are crucial to optimize the ferromagnetic properties. Specifically, under the applied magnetic field of 10 kOe, BHFO and BFMO thin films can produce obvious magnetic properties during magnetization and, additionally, doping with Ho and Mn (BHFMO) can achieve better magnetic properties. This enhancement is attributed to the lattice distortions caused by the ionic sizes difference between the doping agent and the host, the generation of the new exchange interactions and the inhibition of the antiferromagnetic spiral modulated spin structure. This study provides key insights of understanding the tunable ferromagnetic properties of co-doped BFO.

Mo-doped BiVO4 thin films – high photoelectrochemical water splitting performance achieved by a tailored structure and morphology

2017 ◽  
Vol 1 (8) ◽  
pp. 1830-1846 ◽  
Author(s):  
Martin Rohloff ◽  
Björn Anke ◽  
Siyuan Zhang ◽  
Ulrich Gernert ◽  
Christina Scheu ◽  
...  
Keyword(s):  
Thin Films ◽  
Water Splitting ◽  
Sol Gel ◽  
Surface Recombination ◽  
Photoelectrochemical Water Splitting ◽  
Transfer Efficiency ◽  
Hole Transfer ◽  
Structure And Morphology ◽  
Sol Gel Synthesis ◽  
Reduced Surface

Facile sol–gel synthesis of Mo:BiVO4 thin films with optimized morphology results in reduced surface recombination and enhanced hole transfer efficiency.

Effect of N2 Flow Rate on Structure and Morphology of (Ti,Cr)N Thin Films Deposited by Unbalanced Magnetron Co-Sputtering

2012 ◽  
Vol 488-489 ◽  
pp. 432-436
Author(s):  
Chutima Paksunchai ◽  
Somyod Denchitcharoen ◽  
Surasing Chaiyakun ◽  
Pichet Limsuwan
Keyword(s):  
Thin Films ◽  
Flow Rate ◽  
Columnar Structure ◽  
Root Mean Square Roughness ◽  
Cross Sectional ◽  
X Ray ◽  
Force Microscopy ◽  
Unbalanced Magnetron ◽  
Crystallite Sizes ◽  
Scherrer Formula

The (Ti,Cr)N thin films were deposited with various N2 flow rates on silicon wafers by reactive unbalanced magnetron co-sputtering without heating and biasing substrates. The effects of N2 flow rate on the structure and morphologies of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM) and energy dispersive x-ray spectroscopy (EDS). The results revealed that the (Ti,Cr)N thin films formed solid solutions with the fcc structure. The crystallite sizes calculated from Scherrer formula are about 13 nm. The root-mean-square roughness (Rrms) and the thickness (Tth) of the films were slightly decreased with the increase in N2 flow rate. The cross-sectional morphology showed columnar structure corresponding to zone 2. In addition, the N atomic concentration was also increased with the increase in N2 flow rate.

Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering

2006 ◽  
Author(s):  
Junqi Xu ◽  
Lingxia Hang ◽  
Weiguo Liu ◽  
Huiqing Fan ◽  
Yingxue Xing
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Free Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Carbon Thin Films
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