Self-assembled block copolymer templates for atomic layer deposition: The effect of processing solvent

Polymer ◽  
2016 ◽  
Vol 105 ◽  
pp. 214-220 ◽  
Author(s):  
Moshe Moshonov ◽  
Yaron Kauffmann ◽  
Gitti L. Frey
RSC Advances ◽  
2020 ◽  
Vol 10 (57) ◽  
pp. 34333-34343
Author(s):  
D. Beitner ◽  
I. Polishchuk ◽  
E. Asulin ◽  
B. Pokroy

A process of atomic layer deposition (ALD) combined with self-assembled monolayers (SAMs) was used to investigate the possible modification of polyurethane (PUR) paint surface wetting properties without altering their original hue.


2018 ◽  
Vol 5 (16) ◽  
pp. 1800054 ◽  
Author(s):  
Zhixin Wan ◽  
Ha Jin Lee ◽  
Hyun Gu Kim ◽  
Gyeong Cheon Jo ◽  
Woon Ik Park ◽  
...  

2010 ◽  
Vol 518 (15) ◽  
pp. 4126-4130 ◽  
Author(s):  
Kibyung Park ◽  
Younghwan Lee ◽  
Kyung Taek Im ◽  
June Young Lee ◽  
Sangwoo Lim

2006 ◽  
Vol 128 (34) ◽  
pp. 11018-11019 ◽  
Author(s):  
Ying-Bing Jiang ◽  
Nanguo Liu ◽  
Henry Gerung ◽  
Joseph L. Cecchi ◽  
C. Jeffrey Brinker

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