Atomic Layer Deposition of Hafnium Dioxide on TiN and Self-Assembled Monolayer Molecular Film

2009 ◽  
Vol 156 (7) ◽  
pp. H561 ◽  
Author(s):  
Zhong Chen ◽  
Smita Sarkar ◽  
Nivedita Biswas ◽  
Veena Misra
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Hafnium Dioxide ◽  
Self Assembled Monolayer ◽  
Molecular Film ◽  
Layer Deposition ◽  
Self Assembled

Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition

2005 ◽  
Vol 17 (3) ◽  
pp. 536-544 ◽  
Author(s):  
Rong Chen ◽  
Hyoungsub Kim ◽  
Paul C. McIntyre ◽  
Stacey F. Bent
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Hafnium Dioxide ◽  
Self Assembled Monolayer ◽  
Layer Deposition ◽  
Self Assembled

Atomic layer deposition of HfO2 on self-assembled monolayer-passivated Ge surfaces

2010 ◽  
Vol 518 (15) ◽  
pp. 4126-4130 ◽  
Author(s):  
Kibyung Park ◽  
Younghwan Lee ◽  
Kyung Taek Im ◽  
June Young Lee ◽  
Sangwoo Lim
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayer ◽  
Layer Deposition ◽  
Self Assembled

Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition

Langmuir ◽  
2021 ◽  
Vol 37 (39) ◽  
pp. 11637-11645
Author(s):  
Tzu-Ling Liu ◽  
Li Zeng ◽  
Katie L. Nardi ◽  
Dennis M. Hausmann ◽  
Stacey F. Bent
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayer ◽  
Layer Deposition ◽  
Self Assembled

Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics

2004 ◽  
Vol 84 (20) ◽  
pp. 4017-4019 ◽  
Author(s):  
Rong Chen ◽  
Hyoungsub Kim ◽  
Paul C. McIntyre ◽  
Stacey F. Bent
Keyword(s):  
Atomic Layer Deposition ◽  
Gate Dielectrics ◽  
Atomic Layer ◽  
Self Assembled Monolayer ◽  
Layer Deposition ◽  
Self Assembled

Atomic Layer Deposition of Titanium Oxide on Self-Assembled-Monolayer-Coated Gold

2004 ◽  
Vol 16 (10) ◽  
pp. 1878-1883 ◽  
Author(s):  
Eun K. Seo ◽  
Jung W. Lee ◽  
Hyung M. Sung-Suh ◽  
Myung M. Sung
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Atomic Layer ◽  
Self Assembled Monolayer ◽  
Layer Deposition ◽  
Self Assembled

Atomic layer deposition of nanoparticles on self-assembled monolayer modified silicon substrate

2013 ◽  
Vol 1546 ◽  
Author(s):  
Kun Cao ◽  
Zhilong Ren ◽  
Shengmei Xiang ◽  
Bin Shan ◽  
Rong Chen
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Substrate ◽  
Particle Diameter ◽  
Atomic Layer ◽  
Pd Nanoparticles ◽  
Noble Metal Nanoparticles ◽  
Self Assembled Monolayer ◽  
Layer Deposition ◽  
Wide Range ◽  
Self Assembled

ABSTRACTAtomic layer deposition has attracted much attention recently in fabricating noble metal nanoparticles for a wide range of applications. We have explored synthesizing palladium nanoparticles via atomic layer deposition on self-assembled monolayers modified silicon substrate. Using alkyltrichlorosilanes as the passivating agents, our results show the method is capable of fabricating Pd nanoparticles with well controlled density and particle diameter on the modified silicon substrate.

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