scholarly journals Improved Stability and Exciton Diffusion of Self‐Assembled 2D Lattices of Inorganic Perovskite Nanocrystals by Atomic Layer Deposition

2020 ◽  
Vol 8 (20) ◽  
pp. 2000900
Author(s):  
Monica Lorenzon ◽  
Matthew Jurow ◽  
Min Ji Hong ◽  
Yi‐Hsien Lu ◽  
Edward S. Barnard ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Inorganic Perovskite ◽  
Perovskite Nanocrystals ◽  
Exciton Diffusion ◽  
Layer Deposition ◽  
Improved Stability ◽  
Self Assembled

scholarly journals Modifying hydrophilic properties of polyurethane acryl paint substrates by atomic layer deposition and self-assembled monolayers

RSC Advances ◽  
2020 ◽  
Vol 10 (57) ◽  
pp. 34333-34343
Author(s):  
D. Beitner ◽  
I. Polishchuk ◽  
E. Asulin ◽  
B. Pokroy
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayers ◽  
Surface Wetting ◽  
Wetting Properties ◽  
Layer Deposition ◽  
Assembled Monolayers ◽  
Self Assembled

A process of atomic layer deposition (ALD) combined with self-assembled monolayers (SAMs) was used to investigate the possible modification of polyurethane (PUR) paint surface wetting properties without altering their original hue.

scholarly journals Atomic layer deposition for efficient oxygen evolution reaction at Pt/Ir catalyst layers

2020 ◽  
Vol 11 ◽  
pp. 952-959
Author(s):  
Stefanie Schlicht ◽  
Korcan Percin ◽  
Stefanie Kriescher ◽  
André Hofer ◽  
Claudia Weidlich ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Noble Metal ◽  
Bimetallic Catalyst ◽  
Precursor Solution ◽  
Atomic Layer ◽  
Dip Coating ◽  
Experimental Conditions ◽  
Catalyst Layers ◽  
Layer Deposition ◽  
Improved Stability

We provide a direct comparison of two distinct methods of Ti felt surface treatment and Pt/Ir electrocatalyst deposition for the positive electrode of regenerative fuel cells and vanadium–air redox flow batteries. Each method is well documented in the literature, and this paper provides a direct comparison under identical experimental conditions of electrochemical measurements and in identical units. In the first method, based on classical engineering, the bimetallic catalyst is deposited by dip-coating in a precursor solution of the salts followed by their thermal decomposition. In the alternative method, more academic in nature, atomic layer deposition (ALD) is applied to the felts after anodization. ALD allows for a controlled coating with ultralow noble-metal loadings in narrow pores. In acidic electrolyte, the ALD approach yields improved mass activity (557 A·g−1 as compared to 80 A·g−1 at 0.39 V overpotential) on the basis of the noble-metal loading, as well as improved stability.

Atomic Layer Deposition for Improved Stability of Catalysts for the Conversion of Biomass to Chemicals and Fuels

2011 ◽  
Vol 1366 ◽  
Author(s):  
Monika K. Wiedmann ◽  
Yomaira J. Pagan-Torres ◽  
Mark H. Tucker ◽  
James A. Dumesic ◽  
T. F. Kuech
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Rate Constant ◽  
Flow Reactor ◽  
Atomic Layer ◽  
Deactivation Rate ◽  
Layer Deposition ◽  
Improved Stability ◽  
Deactivation Rate Constant ◽  
Acid Catalyzed

ABSTRACTAtomic layer deposition (ALD) has been used to coat SBA-15 and functionalized SBA-15 with various metal oxides. Use of SBA-15 coated with 4-10 ALD cycles of titania, alumina, niobia, or zirconia in the acid-catalyzed dehydration of fructose to 5-hydroxymethylfurfural (HMF) resulted in 24-57% conversion, with 0-22% selectivity, at 130 °C with 2 wt % fructose in 4:1 THF:H2O. Propylsulfonic acid functionalized SBA-15 (SBA-15-PrSO3H) had a 25% conversion and 48% selectivity for HMF under the same conditions. SBA-15-PrSO3H was also coated with 2 ALD cycles of titania followed by 8 ALD cycles silica. The deactivation rate constant for SBA-15-PrSO3H was 2.7 x 10-2 h-1 for the dehydration of fructose to HMF in a flow reactor at 130 °C with a feed of 2 wt % fructose in 4:1 THF:H2O. In comparison, the deactivation rate constant for the ALD coated SBA-15-PrSO3H-ALD was 7.9 x 10-3 h-1.

Atomic layer deposition of HfO2 on self-assembled monolayer-passivated Ge surfaces

2010 ◽  
Vol 518 (15) ◽  
pp. 4126-4130 ◽  
Author(s):  
Kibyung Park ◽  
Younghwan Lee ◽  
Kyung Taek Im ◽  
June Young Lee ◽  
Sangwoo Lim
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayer ◽  
Layer Deposition ◽  
Self Assembled

scholarly journals Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition

2006 ◽  
Vol 128 (34) ◽  
pp. 11018-11019 ◽  
Author(s):  
Ying-Bing Jiang ◽  
Nanguo Liu ◽  
Henry Gerung ◽  
Joseph L. Cecchi ◽  
C. Jeffrey Brinker
Keyword(s):  
Atomic Layer Deposition ◽  
Mesoporous Silica ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Pore Sealing ◽  
Self Assembled

scholarly journals Improved Stability of Polymer Solar Cells in Ambient Air via Atomic Layer Deposition of Ultrathin Dielectric Layers

2017 ◽  
Vol 4 (18) ◽  
pp. 1700231 ◽  
Author(s):  
Ermioni Polydorou ◽  
Martha A. Botzakaki ◽  
Ilias Sakellis ◽  
Anastasia Soultati ◽  
Andreas Kaltzoglou ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Polymer Solar Cells ◽  
Atomic Layer ◽  
Ambient Air ◽  
Dielectric Layers ◽  
Layer Deposition ◽  
Improved Stability
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