scholarly journals Drift mechanism of mass transfer on heterogeneous reaction in crystalline silicon substrate

2017 ◽  
Vol 512 ◽  
pp. 26-31 ◽  
Author(s):  
S.A. Kukushkin ◽  
A.V. Osipov
2016 ◽  
Vol 39 ◽  
pp. 89-95 ◽  
Author(s):  
Anatoly Druzhinin ◽  
Valery Yerokhov ◽  
Stepan Nichkalo ◽  
Yevhen Berezhanskyi

The paper deals with obtaining of textured silicon surfaces by chemical etching. As a result of experiments based on the modification and optimization of obtaining a textured silicon, several methods of chemical texturing of the crystalline silicon surface were developed. It was shown that modified isotropic and anisotropic etching methods are applicable to create a microrelief on the surface of silicon substrate. These methods in addition to their high conversion efficiency can be used for both mono- and multicrystalline silicon which would ensure their industrial use.


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