Deposition Dynamics of Hydrogenated Silicon Clusters on a Crystalline Silicon Substrate under Typical Plasma Conditions†

2010 ◽  
Vol 114 (9) ◽  
pp. 3297-3305 ◽  
Author(s):  
Ning Ning ◽  
Holger Vach
1996 ◽  
Vol 261 (3) ◽  
pp. 346-352 ◽  
Author(s):  
Takehide Miyazaki ◽  
Tsuyoshi Uda ◽  
Ivan Štich ◽  
Kiyoyuki Terakura

1999 ◽  
Vol 40 (4) ◽  
pp. 503-508
Author(s):  
V. P. Meleshko ◽  
Yu. N. Morokov ◽  
V. A. Shveigert

2016 ◽  
Vol 39 ◽  
pp. 89-95 ◽  
Author(s):  
Anatoly Druzhinin ◽  
Valery Yerokhov ◽  
Stepan Nichkalo ◽  
Yevhen Berezhanskyi

The paper deals with obtaining of textured silicon surfaces by chemical etching. As a result of experiments based on the modification and optimization of obtaining a textured silicon, several methods of chemical texturing of the crystalline silicon surface were developed. It was shown that modified isotropic and anisotropic etching methods are applicable to create a microrelief on the surface of silicon substrate. These methods in addition to their high conversion efficiency can be used for both mono- and multicrystalline silicon which would ensure their industrial use.


Sign in / Sign up

Export Citation Format

Share Document