Effects of ion beam etching of fused silica substrates on the laser-induced damage properties of antireflection coatings at 355 nm

2019 ◽  
Vol 90 ◽  
pp. 172-179 ◽  
Author(s):  
Kesheng Guo ◽  
Yanzhi Wang ◽  
Ruiyi Chen ◽  
Meiping Zhu ◽  
Kui Yi ◽  
...  
Keyword(s):  
Ion Beam ◽  
Fused Silica ◽  
Antireflection Coatings ◽  
Ion Beam Etching ◽  
Laser Induced Damage ◽  
Silica Substrates

scholarly journals Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Materials ◽  
2020 ◽  
Vol 13 (6) ◽  
pp. 1294
Author(s):  
Yaoyu Zhong ◽  
Yifan Dai ◽  
Feng Shi ◽  
Ci Song ◽  
Ye Tian ◽  
...  
Keyword(s):  
Silica Surface ◽  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Structural Defects ◽  
Laser Damage ◽  
Material Structure ◽  
Ion Beam Etching ◽  
Damage Resistance ◽  
Laser Induced Damage

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

scholarly journals Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica

2016 ◽  
Vol 24 (18) ◽  
pp. 20842 ◽  
Author(s):  
Feng Shi ◽  
Yaoyu Zhong ◽  
Yifan Dai ◽  
Xiaoqiang Peng ◽  
Mingjin Xu ◽  
...  
Keyword(s):  
Ion Beam ◽  
Damage Threshold ◽  
Surface Damage ◽  
Fused Silica ◽  
Ion Beam Etching ◽  
Damage Precursor ◽  
Laser Induced Damage

Fabrication of Phase Mask for Optical Fiber Grating

2007 ◽  
Vol 364-366 ◽  
pp. 719-723
Author(s):  
Quan Liu ◽  
Jian Hong Wu ◽  
Ling Ling Fang ◽  
Chao Ming Li
Keyword(s):  
Diffraction Efficiency ◽  
Ion Beam ◽  
Fused Silica ◽  
Phase Mask ◽  
Fiber Grating ◽  
Ion Beam Etching ◽  
First Order ◽  
Silica Substrate ◽  
Order Diffraction ◽  
A New Technique

A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves several steps: coating of substrates with controlled thickness of photoresist, formation of a grating mask by holograph interference exposure and development, and finally transferring etching of this mask into the fused silica substrate to form a permanent phase mask. Experimental measurements have shown that the zero order diffraction efficiency is less than 4% and the plus and minus first-order diffraction efficiency is more than 35%. Theoretical analysis has shown that these phase masks can be used for fabricating UV written Fiber Bragg Gratings.

scholarly journals Investigation of laser-induced damage threshold improvement mechanism during ion beam sputtering of fused silica

2017 ◽  
Vol 25 (23) ◽  
pp. 29260 ◽  
Author(s):  
Mingjin Xu ◽  
Feng Shi ◽  
Lin Zhou ◽  
Yifan Dai ◽  
Xiaoqiang Peng ◽  
...  
Keyword(s):  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Laser Induced Damage

scholarly journals Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching

RSC Advances ◽  
2018 ◽  
Vol 8 (57) ◽  
pp. 32417-32422
Author(s):  
Laixi Sun ◽  
Ting Shao ◽  
Jianfeng Xu ◽  
Xiangdong Zhou ◽  
Xin Ye ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Silica Surface ◽  
Ion Beam ◽  
Fused Silica ◽  
Laser Damage ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

RIBE and DCE techniques can be combined to tracelessly mitigate laser damage precursors on a fused silica surface.

Ion-beam polishing of fused silica substrates for imaging soft x-ray and extreme ultraviolet optics

2016 ◽  
Vol 55 (6) ◽  
pp. 1249 ◽  
Author(s):  
N. I. Chkhalo ◽  
S. A. Churin ◽  
M. S. Mikhaylenko ◽  
A. E. Pestov ◽  
V. N. Polkovnikov ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Ion Beam ◽  
Fused Silica ◽  
X Ray ◽  
Silica Substrates

scholarly journals Detailed near-surface nanoscale damage precursor measurement and characterization of fused silica optics assisted by ion beam etching

2019 ◽  
Vol 27 (8) ◽  
pp. 10826 ◽  
Author(s):  
Yaoyu Zhong ◽  
Feng Shi ◽  
Ye Tian ◽  
Yifan Dai ◽  
Ci Song ◽  
...  
Keyword(s):  
Ion Beam ◽  
Fused Silica ◽  
Ion Beam Etching ◽  
Near Surface ◽  
Damage Precursor

Reactive ion beam etching of fused silica using vertical lamellar patterns of PS-b-PMMA diblock copolymer masks

2015 ◽  
Vol 141 ◽  
pp. 289-293 ◽  
Author(s):  
Joachim Zajadacz ◽  
Pierre Lorenz ◽  
Frank Frost ◽  
Renate Fechner ◽  
Christian Steinberg ◽  
...  
Keyword(s):  
Diblock Copolymer ◽  
Ion Beam ◽  
Fused Silica ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching
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