Growth of CVD diamond nanopillars with imbedded silicon-vacancy color centers

2016 ◽  
Vol 61 ◽  
pp. 25-29 ◽  
Author(s):  
D.N. Sovyk ◽  
V.G. Ralchenko ◽  
K.N. Tukmakov ◽  
V.A. Shershulin ◽  
A.A. Khomich ◽  
...  
Author(s):  
Mikhail Lobaev ◽  
Alexey Gorbachev ◽  
Dmitry Radishev ◽  
Anatoly Vikharev ◽  
Sergey Bogdanov ◽  
...  

The results of a study of the deposition of silicon-doped epitaxial diamond layers in a microwave CVD reactor to create silicon-vacancy color centers are presented. The relationship between the optical...


2021 ◽  
Vol 218 (19) ◽  
pp. 2170054
Author(s):  
Konosuke Shimazaki ◽  
Hiroki Kawaguchi ◽  
Hideaki Takashima ◽  
Takuya Fabian Segawa ◽  
Frederick T.-K. So ◽  
...  

2021 ◽  
Author(s):  
Yexin Fan ◽  
ying song ◽  
zongwei xu ◽  
jintong wu ◽  
rui zhu ◽  
...  

Abstract Molecular dynamics (MD) simulation is adopted to discover the underlying mechanism of silicon vacancy color center and damage evolution during helium ions implanted four-hexagonal silicon carbide (4H-SiC) and subsequent annealing. The atomic-scale mechanism of silicon vacancy color centers in the process of He ion implantation into 4H-SiC can be described more accurately by incorporating electron stopping power for He ion implantation. We present a new method for calculating the silicon vacancy color center numerically, which considers the structure around the color center and makes the statistical results more accurate than the Wigner-Seitz defect analysis method. At the same time, photoluminescence (PL) spectroscopy of silicon vacancy color center under different helium ion doses is also characterized for validating the numerical analysis. The MD simulation of the optimal annealing temperature of silicon vacancy color center is predicted by the proposed new method.


Author(s):  
Haritha Kambalathmana ◽  
Assegid Mengistu Flatae ◽  
Stefano Lagomarsino ◽  
Hossam Galal ◽  
Francesco Tantussi ◽  
...  

2019 ◽  
Vol 125 (7) ◽  
Author(s):  
E. J. Di Liscia ◽  
M. Reinoso ◽  
F. Álvarez ◽  
H. Huck

2017 ◽  
Vol 214 (11) ◽  
pp. 1700586 ◽  
Author(s):  
Jonas Nils Becker ◽  
Christoph Becher

2017 ◽  
Vol 73 ◽  
pp. 204-209 ◽  
Author(s):  
Bing Dai ◽  
Guoyang Shu ◽  
Victor Ralchenko ◽  
Andrey Bolshakov ◽  
Dmitry Sovyk ◽  
...  

2015 ◽  
Vol 1728 ◽  
Author(s):  
Stefano Gay ◽  
Giacomo Reina ◽  
Ilaria Cianchetta ◽  
Emanuela Tamburri ◽  
Mariglen Angjellari ◽  
...  

ABSTRACTWe report here on the chemical methodologies that are being settled in our labs for the insertion in diamond of foreign atoms and consequent creation of fluorescent defects. The inclusion of Si, Cr, Ge, able to produce color centers, is directly obtained during the process of diamond synthesis by means of a CVD technique. The deposition of the diamond films takes place on substrates of different nature, treated following procedures specifically settled to control the insertion of the different species. The photoluminescence emission from a series of diamond samples grown on different substrates (Si, Ge and Ti) has been investigated and is discussed with reference to the morphological/structural features of the diamond phase and to the experimental procedures adopted for substrate preparation.


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