HfAlON films fabricated by pulsed laser ablation for high-k gate dielectric applications

2005 ◽  
Vol 59 (7) ◽  
pp. 821-825 ◽  
Author(s):  
J. Zhu ◽  
Z.G. Liu ◽  
Y.R. Li
Keyword(s):  
Laser Ablation ◽  
Gate Dielectric ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
High K ◽  
High K Gate Dielectric

Pulsed laser deposited ZrAlON films for high-k gate dielectric applications

2005 ◽  
Vol 81 (6) ◽  
pp. 1167-1171 ◽  
Author(s):  
J. Zhu ◽  
Z.G. Liu ◽  
Y.R. Li
Keyword(s):  
Gate Dielectric ◽  
Pulsed Laser ◽  
High K ◽  
High K Gate Dielectric

Hetero-epitaxial growth of the cubic single crystalline HfO2 film as high k materials by pulsed laser ablation

2010 ◽  
Vol 312 (20) ◽  
pp. 2928-2930 ◽  
Author(s):  
Xinqiang Zhang ◽  
Hailing Tu ◽  
Xiaona Wang ◽  
Yuhua Xiong ◽  
Mengmeng Yang ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Epitaxial Growth ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Hfo2 Film ◽  
Single Crystalline ◽  
High K ◽  
High K Materials
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