Silicon microtubes made by immersing macroporous silicon into ammonium fluoride solution

2015 ◽  
Vol 160 ◽  
pp. 12-19 ◽  
Author(s):  
Danilo Roque Huanca ◽  
Hae Yong Kim ◽  
Walter Jaimes Salcedo
Keyword(s):  
Ammonium Fluoride ◽  
Macroporous Silicon ◽  
Fluoride Solution

High resolution surface analysis of Si roughening in dilute ammonium fluoride solution

2003 ◽  
Vol 540 ◽  
pp. 3-6 ◽  
Author(s):  
H.J Lewerenz ◽  
M Aggour ◽  
C Murrell ◽  
J Jakubowicz ◽  
M Kanis ◽  
...  
Keyword(s):  
High Resolution ◽  
Surface Analysis ◽  
Ammonium Fluoride ◽  
Fluoride Solution

scholarly journals Porous Glass Treated with Ammonium Fluoride Solution

1989 ◽  
Vol 97 (1123) ◽  
pp. 245-250 ◽  
Author(s):  
Nobuo TAKUSAGAWA ◽  
Shinji YANAGIDA ◽  
Kunio KITAJIMA
Keyword(s):  
Porous Glass ◽  
Ammonium Fluoride ◽  
Fluoride Solution

Emission Spectrographic Analysis of Boron in 40% NH4F Solution

1974 ◽  
Vol 28 (4) ◽  
pp. 369-371 ◽  
Author(s):  
Carlo Grilletto
Keyword(s):  
Detection Limit ◽  
Reliable Method ◽  
Boron Content ◽  
Accurate Determination ◽  
Ammonium Fluoride ◽  
Spectrographic Analysis ◽  
Fluoride Solution ◽  
Spectrographic Method ◽  
Boron Level

This paper describes a reliable emission spectrographic method capable of quantitatively determining boron in the 0.5 to 50 ppm range. The detection limit for the method is 0.1 ppm. Previous to this report no reliable method was available for the accurate determination of boron in reagent 40% ammonium fluoride solution in the ppm range; consequently, no incoming inspection or manufacturer's certification was available for boron content. Analysis of representative ammonium fluoride samples shows that the boron level is less than 0.1 ppm, suggesting that this element may not be a major problem in ammonium fluoride reagent.

Surface analysis of the electropolishing layer on Si(111) in ammonium fluoride solution

2000 ◽  
Vol 45 (28) ◽  
pp. 4615-4627 ◽  
Author(s):  
H.J Lewerenz ◽  
H Jungblut ◽  
S Rauscher
Keyword(s):  
Surface Analysis ◽  
Ammonium Fluoride ◽  
Fluoride Solution

Microwave Reflectance Studies of Photoelectrochemical Kinetics at Semiconductor Electrodes. 2. Hydrogen Evolution at p-Si in Ammonium Fluoride Solution

2003 ◽  
Vol 107 (24) ◽  
pp. 5864-5870 ◽  
Author(s):  
Michael J. Cass ◽  
Noel W. Duffy ◽  
Laurence M. Peter ◽  
Stephen R. Pennock ◽  
Shin Ushiroda ◽  
...  
Keyword(s):  
Hydrogen Evolution ◽  
Ammonium Fluoride ◽  
Fluoride Solution ◽  
Semiconductor Electrodes

Spectroscopic investigations of the stability of porous silicon structure obtained by etching Si(100) in aqueous ammonium fluoride solution

2010 ◽  
Vol 36 (2) ◽  
pp. 119-121
Author(s):  
E. O. Filatova ◽  
K. M. Lysenkov ◽  
A. A. Sokolov ◽  
A. A. Ovchinnikov ◽  
D. E. Marchenko ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Ammonium Fluoride ◽  
Silicon Structure ◽  
Fluoride Solution ◽  
Spectroscopic Investigations ◽  
The Stability

Mild and Efficient Vicinal Dibromination of Olefins Mediated by Aqueous Ammonium Fluoride

Synlett ◽  
2017 ◽  
Vol 29 (04) ◽  
pp. 419-424 ◽  
Author(s):  
Tony Shing ◽  
Ying-Yeung Yeung ◽  
Wing Ng
Keyword(s):  
Ammonium Fluoride ◽  
Available N ◽  
Fluoride Solution

A mild and efficient vicinal dibromination of olefins has been developed by using saturated aqueous ammonium fluoride solution as the promoter. Inexpensive and commercially available N-bromosuccinimide (NBS) was used as the brominating reagent. The corresponding vicinal dibromoalkanes could be obtained in good to excellent yields.

scholarly journals Synthesis and Photoelectrochemical Activity of TiO2 Nanotube Based Free Standing Membrane

2020 ◽  
Vol 32 (11) ◽  
pp. 2739-2742
Author(s):  
Misriyani ◽  
E.S. Kunarti
Keyword(s):  
Tio2 Nanotubes ◽  
Ammonium Fluoride ◽  
Optimal Conditions ◽  
X Ray Diffraction ◽  
Free Standing ◽  
Photoelectrochemical Activity ◽  
Fluoride Solution ◽  
X Ray ◽  
Anodization Method ◽  
Scanning Electron

TiO2 nanotubes (TNTs) were synthesized and modified using the anodization method in a glycerol and ammonium fluoride solution, which was followed by a thermal treatment. The second anodisation was continued by increasing anodizing voltage to deposit a film on the surface of titanium, which resulted in a free standing membrane based on of TNTs. The nanotubes were further characterised using X-ray diffraction (XRD), scanning electron microscopy (SEM), and Fourier transform infrared (FTIR) spectroscopy. The SEM result showed that the layer thickness of free standing membrane based on TNTs increased with an increase in the anodizing voltage; however, at high voltages, this layer was damaged. The XRD and FTIR results indicated the generation of TNT having an anatase crystal phase. The results of test for photoelectrochemical properties showed that the optimal conditions of anodizing voltage was 50 V maintained for 1 h.

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