scholarly journals Pseudo-capacitance of silver oxide thin film electrodes in ionic liquid for electrochemical energy applications

2019 ◽  
Vol 4 (2) ◽  
pp. 213-222 ◽  
Author(s):  
Alex.I. Oje ◽  
A.A. Ogwu ◽  
Mojtaba Mirzaeian ◽  
Nathaniel Tsendzughul ◽  
A.M. Oje
Keyword(s):  
Thin Film ◽  
Ionic Liquid ◽  
Silver Oxide ◽  
Oxide Thin Film ◽  
Energy Applications ◽  
Thin Film Electrodes ◽  
Electrochemical Energy

scholarly journals Surface characteristics of silver oxide thin film electrodes for supercapacitor applications

2017 ◽  
Vol 519 ◽  
pp. 223-230 ◽  
Author(s):  
Mojtaba Mirzaeian ◽  
Abraham A. Ogwu ◽  
Hassan Fathinejad Jirandehi ◽  
Saule Aidarova ◽  
Zhanar Ospanova ◽  
...  
Keyword(s):  
Thin Film ◽  
Silver Oxide ◽  
Surface Characteristics ◽  
Oxide Thin Film ◽  
Thin Film Electrodes ◽  
Supercapacitor Applications

scholarly journals Optoelectronic properties of highly porous silver oxide thin film

2021 ◽  
Vol 3 (1) ◽  
Author(s):  
Ahmad Al-Sarraj ◽  
Khaled M. Saoud ◽  
Abdelaziz Elmel ◽  
Said Mansour ◽  
Yousef Haik
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electron Microscope ◽  
Plasma Etching ◽  
Silver Oxide ◽  
Oxidation Time ◽  
Oxide Thin Film ◽  
X Ray ◽  
Porous Silver ◽  
Highly Porous

Abstract In this paper, we report oxidation time effect on highly porous silver oxide nanowires thin films fabricated using ultrasonic spray pyrolysis and oxygen plasma etching method. The NW’s morphological, electrical, and optical properties were investigated under different plasma etching periods and the number of deposition cycles. The increase of plasma etching and oxidation time increases the surface roughness of the Ag NWs until it fused to form a porous thin film of silver oxide. AgNWs based thin films were characterized using X-ray diffraction, scanning electron microscope, transmission electron microscope, X-ray photoemission spectroscopy, and UV–Vis spectroscopy techniques. The obtained results indicate the formation of mixed mesoporous Ag2O and AgO NW thin films. The Ag2O phase of silver oxide appears after 300 s of oxidation under the same conditions, while the optical transparency of the thin film decreases as plasma etching time increases. The sheet resistance of the final film is influenced by the oxidation time and the plasma application periodicity. Graphic abstract

ChemInform Abstract: Charge-Discharge Performance of Electron-Beam-Deposited Tin Oxide Thin-Film Electrodes.

ChemInform ◽  
2010 ◽  
Vol 30 (9) ◽  
pp. no-no
Author(s):  
S. C. Nam ◽  
Y. H. Kim ◽  
W. I. Cho ◽  
B. W. Cho ◽  
H. S. Chun ◽  
...  
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Tin Oxide ◽  
Oxide Thin Film ◽  
Discharge Performance ◽  
Thin Film Electrodes ◽  
Charge Discharge

Indirect oxidation of ethylene glycol by peroxide ions at Ni0.3Co2.7O4 spinel oxide thin film electrodes

2000 ◽  
Vol 45 (27) ◽  
pp. 4431-4440 ◽  
Author(s):  
E Rı́os ◽  
H Nguyen-Cong ◽  
J.F Marco ◽  
J.R Gancedo ◽  
P Chartier ◽  
...  
Keyword(s):  
Thin Film ◽  
Ethylene Glycol ◽  
Oxide Thin Film ◽  
Spinel Oxide ◽  
Indirect Oxidation ◽  
Thin Film Electrodes

ChemInform Abstract: The Electrochromic Process in Non-Stoichiometric Nickel Oxide Thin Film Electrodes.

ChemInform ◽  
2010 ◽  
Vol 23 (27) ◽  
pp. no-no
Author(s):  
F. DECKER ◽  
S. PASSERINI ◽  
R. PILEGGI ◽  
B. SCROSATI
Keyword(s):  
Thin Film ◽  
Nickel Oxide ◽  
Oxide Thin Film ◽  
Thin Film Electrodes ◽  
Nickel Oxide Thin Film
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