Electrical characterization of nylon-6 composite nanofibers

2012 ◽  
Vol 73 (11) ◽  
pp. 1326-1330 ◽  
Author(s):  
R. Nirmala ◽  
R. Navamathavan ◽  
Jeong Jin Won ◽  
Kyungsoo Jeon ◽  
R. Afeesh ◽  
...  
Keyword(s):  
Composite Nanofibers ◽  
Electrical Characterization ◽  
Nylon 6

Preparation and characterization of nylon-6/gelatin composite nanofibers via electrospinning for biomedical applications

2013 ◽  
Vol 14 (5) ◽  
pp. 718-723 ◽  
Author(s):  
Gopal Panthi ◽  
Nasser A. M. Barakat ◽  
Prabodh Risal ◽  
Ayman Yousef ◽  
Bishweshwar Pant ◽  
...  
Keyword(s):  
Biomedical Applications ◽  
Composite Nanofibers ◽  
Nylon 6

Preparation and electrical characterization of polyamide-6/chitosan composite nanofibers via electrospinning

2011 ◽  
Vol 65 (3) ◽  
pp. 493-496 ◽  
Author(s):  
R. Nirmala ◽  
R. Navamathavan ◽  
Mohamed H. El-Newehy ◽  
Hak Yong Kim
Keyword(s):  
Composite Nanofibers ◽  
Electrical Characterization ◽  
Polyamide 6 ◽  
Chitosan Composite

Structural and Electrical Characterization of Shaped Beam Laser Recrystallized Polysilicon on Amorphous Substrates

1981 ◽  
Vol 4 ◽  
Author(s):  
T. J. Stultz ◽  
J. F. Gibbons
Keyword(s):  
Grain Size ◽  
Electrical Characterization ◽  
Grain Structure ◽  
Electrical Characteristics ◽  
Shaped Beam ◽  
Beam Laser ◽  
Cw Laser ◽  
Amorphous Substrates ◽  
Circular Beam

ABSTRACTStructural and electrical characterization of laser recrystallized LPCVD silicon films on amorphous substrates using a shaped cw laser beam have been performed. In comparing the results to data obtained using a circular beam, it was found that a significant increase in grain size can be achieved and that the surface morphology of the shaped beam recrystallized material was much smoother. It was also found that whereas circular beam recrystallized material has a random grain structure, shaped beam material is highly oriented with a <100> texture. Finally the electrical characteristics of the recrystallized film were very good when measured in directions parallel to the grain boundaries.

A Possible Basis for Nondestructive Characterization of Ropes of Nylon 6

1997 ◽  
Vol 503 ◽  
Author(s):  
H. Jiang ◽  
M. K. Davis ◽  
R. K. Eby ◽  
P. Arsenovic
Keyword(s):  
Tensile Strength ◽  
Service Life ◽  
Fiber Diameter ◽  
Structural Parameters ◽  
Crystal Form ◽  
Nylon 6 ◽  
Remaining Service Life ◽  
Nondestructive Characterization ◽  
Fractional Content

ABSTRACTPhysical properties and structural parameters have been measured for ropes of nylon 6 as a function of the number of use operations. The fractional content of the α crystal form, sound velocity, birefringence, tensile strength and length all increase systematically and significantly with increasing the number of use operations. The fractional content of the γ crystal form and fiber diameter decrease with use. These trends indicate that the measurement of such properties and structural parameters, especially the length, provide a possible basis for establishing a reliable, rapid, and convenient nondestructive characterization method to predict the remaining service life of nylon 6 ropes.

Vapor Deposition Polymerization and Electrical Characterization of TPD Thin Films

2011 ◽  
Vol E94-C (2) ◽  
pp. 157-163 ◽  
Author(s):  
Masakazu MUROYAMA ◽  
Ayako TAJIRI ◽  
Kyoko ICHIDA ◽  
Seiji YOKOKURA ◽  
Kuniaki TANAKA ◽  
...  
Keyword(s):  
Thin Films ◽  
Vapor Deposition ◽  
Electrical Characterization

Processing and Characterization of Polyphenylene Ether/Polystyrene/Nylon-6 Ternary Blends

2020 ◽  
Vol 35 (2) ◽  
pp. 169-183 ◽  
Author(s):  
P. Hadimani ◽  
H. N. Narasimha Murthy ◽  
R. Mudbidre
Keyword(s):  
Nylon 6 ◽  
Ternary Blends

Electrical Characterization of Different Failure Modes in Sub-100 nm Devices Using Nanoprobing Technique

2009 ◽  
Author(s):  
E. Hendarto ◽  
S.L. Toh ◽  
J. Sudijono ◽  
P.K. Tan ◽  
H. Tan ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Focused Ion Beam ◽  
Failure Modes ◽  
Ion Beam ◽  
Electrical Characterization ◽  
Nickel Silicide ◽  
Fault Isolation ◽  
Technology Nodes ◽  
Scanning Electron

Abstract The scanning electron microscope (SEM) based nanoprobing technique has established itself as an indispensable failure analysis (FA) technique as technology nodes continue to shrink according to Moore's Law. Although it has its share of disadvantages, SEM-based nanoprobing is often preferred because of its advantages over other FA techniques such as focused ion beam in fault isolation. This paper presents the effectiveness of the nanoprobing technique in isolating nanoscale defects in three different cases in sub-100 nm devices: soft-fail defect caused by asymmetrical nickel silicide (NiSi) formation, hard-fail defect caused by abnormal NiSi formation leading to contact-poly short, and isolation of resistive contact in a large electrical test structure. Results suggest that the SEM based nanoprobing technique is particularly useful in identifying causes of soft-fails and plays a very important role in investigating the cause of hard-fails and improving device yield.

Case Studies in Atomic Force Probe Analysis

2006 ◽  
Author(s):  
Randal Mulder ◽  
Sam Subramanian ◽  
Tony Chrastecky
Keyword(s):  
Failure Analysis ◽  
Case Studies ◽  
Light Emission ◽  
Electrical Characterization ◽  
Logic Circuits ◽  
Contrast Imaging ◽  
Atomic Force ◽  
Measuring Surface ◽  
Analysis Environment

Abstract The use of atomic force probe (AFP) analysis in the analysis of semiconductor devices is expanding from its initial purpose of solely characterizing CMOS transistors at the contact level with a parametric analyzer. Other uses found for the AFP include the full electrical characterization of failing SRAM bit cells, current contrast imaging of SOI transistors, measuring surface roughness, the probing of metallization layers to measure leakages, and use with other tools, such as light emission, to quickly localize and identify defects in logic circuits. This paper presents several case studies in regards to these activities and their results. These case studies demonstrate the versatility of the AFP. The needs and demands of the failure analysis environment have quickly expanded its use. These expanded capabilities make the AFP more valuable for the failure analysis community.

Analysis of an Anomalous CMOS Transistor Exhibiting Drain to Source Leakage—Its Model and Cause

2014 ◽  
Author(s):  
Yuk L. Tsang ◽  
Alex VanVianen ◽  
Xiang D. Wang ◽  
N. David Theodore
Keyword(s):  
Threshold Voltage ◽  
Crystalline Silicon ◽  
Electrical Characterization ◽  
Visual Defect ◽  
Scanning Capacitance Microscopy ◽  
Device Model ◽  
Graphical Simulation ◽  
Cmos Transistor

Abstract In this paper, we report a device model that has successfully described the characteristics of an anomalous CMOS NFET and led to the identification of a non-visual defect. The model was based on detailed electrical characterization of a transistor exhibiting a threshold voltage (Vt) of about 120mv lower than normal and also exhibiting source to drain leakage. Using a simple graphical simulation, we predicted that the anomalous device was a transistor in parallel with a resistor. It was proposed that the resistor was due to a counter doping defect. This was confirmed using Scanning Capacitance Microscopy (SCM). The dopant defect was shown by TEM imaging to be caused by a crystalline silicon dislocation.

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