Functionalization of gold mercaptopropionic acid self-assembled monolayer with 5-amino-1,10-phenanthroline: Interaction with iron(II) and application for selective recognition of guanine

2015 ◽  
Vol 164 ◽  
pp. 344-352 ◽  
Author(s):  
Reza Karimi Shervedani ◽  
Marzieh Samiei Foroushani ◽  
Sedigheh Bagheri Dehaghi
Keyword(s):  
Selective Recognition ◽  
Self Assembled Monolayer ◽  
Mercaptopropionic Acid ◽  
Self Assembled

Acetylcholinesterase Immobilization on 3-Mercaptopropionic Acid Self Assembled Monolayer for Determination of Pesticides

2007 ◽  
Vol 19 (13) ◽  
pp. 1415-1420 ◽  
Author(s):  
Valber A. Pedrosa ◽  
Josiane Caetano ◽  
Sergio A. S. Machado ◽  
Renato S. Freire ◽  
Mauro Bertotti
Keyword(s):  
Self Assembled Monolayer ◽  
Mercaptopropionic Acid ◽  
Self Assembled

scholarly journals Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

2013 ◽  
Vol 4 ◽  
pp. 638-648 ◽  
Author(s):  
Tatjana Ladnorg ◽  
Alexander Welle ◽  
Stefan Heißler ◽  
Christof Wöll ◽  
Hartmut Gliemann
Keyword(s):  
Atomic Force Microscopy ◽  
Metal Organic Frameworks ◽  
Selective Growth ◽  
Self Assembled Monolayer ◽  
Mercaptopropionic Acid ◽  
Force Microscopy ◽  
Atomic Force ◽  
Metal Organic ◽  
Self Assembled ◽  
Site Selective

Surface anchored metal-organic frameworks, SURMOFs, are highly porous materials, which can be grown on modified substrates as highly oriented, crystalline coatings by a quasi-epitaxial layer-by-layer method (liquid-phase epitaxy, or LPE). The chemical termination of the supporting substrate is crucial, because the most convenient method for substrate modification is the formation of a suitable self-assembled monolayer. The choice of a particular SAM also allows for control over the orientation of the SURMOF. Here, we demonstrate for the first time the site-selective growth of the SURMOF HKUST-1 on thiol-based self-assembled monolayers patterned by the nanografting technique, with an atomic force microscope as a structuring tool. Two different approaches were applied: The first one is based on 3-mercaptopropionic acid molecules which are grafted in a 1-decanethiolate SAM, which serves as a matrix for this nanolithography. The second approach uses 16-mercaptohexadecanoic acid, which is grafted in a matrix of an 1-octadecanethiolate SAM. In both cases a site-selective growth of the SURMOF is observed. In the latter case the roughness of the HKUST-1 is found to be significantly higher than for the 1-mercaptopropionic acid. The successful grafting process was verified by time-of-flight secondary ion mass spectrometry and atomic force microscopy. The SURMOF structures grown via LPE were investigated and characterized by atomic force microscopy and Fourier-transform infrared microscopy.

Self-assembled monolayer of 3-mercaptopropionic acid on electrospun polystyrene membranes for Cu2+ detection

2012 ◽  
Vol 161 (1) ◽  
pp. 322-328 ◽  
Author(s):  
Min Sun ◽  
Bin Ding ◽  
Jianyong Yu ◽  
You-Lo Hsieh ◽  
Gang Sun
Keyword(s):  
Self Assembled Monolayer ◽  
Mercaptopropionic Acid ◽  
Self Assembled
Sign in / Sign up

Export Citation Format

Share Document