Improvement of electrochemical and thermal stability of LiFePO4@C batteries by depositing amorphous silicon film

2011 ◽  
Vol 56 (14) ◽  
pp. 4937-4941 ◽  
Author(s):  
Yingbin Lin ◽  
Yanmin Yang ◽  
Ying Lin ◽  
Baozhi Zeng ◽  
Guiying Zhao ◽  
...  
1997 ◽  
Vol 471 ◽  
Author(s):  
J. H. Kim ◽  
J. H. Choi ◽  
C. W. Kim ◽  
J. H. Souk

ABSTRACTThe Cl doped amorphous silicon film was deposited from SiH4, SiH2C12 and H2 gas mixture by PECVD process and their properties with various SiH2C12 flow rate is discussed. Controlling the amount of Cl doped was crucial for acquiring high stability TFT without lowering on current. Amorphous silicon and Cl doped amorphous silicon double layer TFT structure, with satisfactory on current and throughput, proved to be more stable than conventional amorphous silicon TFT in photo state and in elevated temperatures.


2000 ◽  
Vol 609 ◽  
Author(s):  
Stefan Costea ◽  
Franco Gaspari ◽  
Tome Kosteski ◽  
Stefan Zukotynski ◽  
Nazir P. Kherani ◽  
...  

ABSTRACTThe change with time in the electrical conductivity of a hydrogenated-tritiated amorphous silicon film (a-Si:H:T) has been studied. The conductivity decreased with time after deposition. A model is developed to account for the decrease. The radioactive decay of tritium into helium produces energetic beta particles. Each β particle creates over 1500 electron-hole pairs in the film thereby increasing the conductivity of the film. The 3He atoms diffuse away leaving dangling bonds behind. We find that neutral dangling bonds (D0) are responsible for the decrease in conductivity by acting as recombination centers in the material.


2006 ◽  
Vol 45 (10A) ◽  
pp. 7675-7676 ◽  
Author(s):  
Jun-Dar Hwang ◽  
Tzu-Yi Chi ◽  
Jun-Chin Liu ◽  
Chung-Yuan Kung ◽  
In-Cha Hsein

2016 ◽  
Vol 36 (3) ◽  
pp. 0325001
Author(s):  
安倩 An Qian ◽  
侯金 Hou Jin ◽  
王文珍 Wang Wenzhen ◽  
杨春勇 Yang Chunyong ◽  
钟志有 Zhong Zhiyou

1996 ◽  
Vol 279 (1-2) ◽  
pp. 174-179 ◽  
Author(s):  
T. Yamaguchi ◽  
Y. Kaneko ◽  
A.H. Jayatissa ◽  
M. Aoyama

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