XPS studies on damage evaluation of single-crystal diamond chips processed with ion beam etching and reactive ion beam assisted chemical etching

2004 ◽  
Vol 13 (1) ◽  
pp. 93-98 ◽  
Author(s):  
Yusaku Kawabata ◽  
Jun Taniguchi ◽  
Iwao Miyamoto
Keyword(s):  
Single Crystal ◽  
Chemical Etching ◽  
Ion Beam ◽  
Damage Evaluation ◽  
Ion Beam Etching ◽  
Single Crystal Diamond

Hydrogen Ion Beam Processing of Single Crystal Diamond Chips

1994 ◽  
Vol 354 ◽  
Author(s):  
Shuji Kiyohara ◽  
Iwao Miyamoto
Keyword(s):  
Surface Roughness ◽  
Single Crystal ◽  
Incidence Angle ◽  
Ion Beam ◽  
Etching Rate ◽  
Hydrogen Ion ◽  
Hydrogen Ions ◽  
Ion Beam Etching ◽  
Single Crystal Diamond ◽  
Before And After

AbstractIn order to apply ion beam etching with hydrogen ions to the ultra-precision processing of diamond tools, hydrogen ion beam etching characteristics of single crystal diamond chips with (100) face were investigated. The etching rate of diamond for 500 eV and 1000 eV hydrogen ions increases with the increase of the ion incidence angle, and eventually reaches a maximum at the ion incidence angle of approximately 50°, then may decrease with the increase of the ion incidence angle. The dependence of the etching rate on the ion incidence angle of hydrogen ions is fairly similar to that obtained with argon ions. Furthermore, the surface roughness of diamond chips before and after hydrogen ion beam etching was evaluated using an atomic force microscope. Consequently, the surface roughness after hydrogen ion beam etching decreases with the increase of the ion incidence angle within range of the ion incidence angle of 60°.

scholarly journals Non-contact polishing of single crystal diamond by ion beam etching

2019 ◽  
Vol 92 ◽  
pp. 248-252 ◽  
Author(s):  
Sichen Mi ◽  
Adrien Toros ◽  
Teodoro Graziosi ◽  
Niels Quack
Keyword(s):  
Single Crystal ◽  
Ion Beam ◽  
Ion Beam Etching ◽  
Single Crystal Diamond

scholarly journals Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching

RSC Advances ◽  
2018 ◽  
Vol 8 (57) ◽  
pp. 32417-32422
Author(s):  
Laixi Sun ◽  
Ting Shao ◽  
Jianfeng Xu ◽  
Xiangdong Zhou ◽  
Xin Ye ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Silica Surface ◽  
Ion Beam ◽  
Fused Silica ◽  
Laser Damage ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

RIBE and DCE techniques can be combined to tracelessly mitigate laser damage precursors on a fused silica surface.

Surface morphology analysis of natural single crystal diamond chips bombarded with Ar+ ion beam

Vacuum ◽  
2010 ◽  
Vol 84 (12) ◽  
pp. 1423-1426 ◽  
Author(s):  
Takashi Nagase ◽  
Hiroyuki Kato ◽  
Shahjada A. Pahlovy ◽  
Iwao Miyamoto
Keyword(s):  
Surface Morphology ◽  
Single Crystal ◽  
Ion Beam ◽  
Morphology Analysis ◽  
Single Crystal Diamond

Removal and characterization of focused-ion-beam-induced damaged layer on single crystal diamond surface and application to multiple depth patterning

2016 ◽  
Vol 70 ◽  
pp. 159-166 ◽  
Author(s):  
Noritaka Kawasegi ◽  
Seiya Kuroda ◽  
Noboru Morita ◽  
Kazuhito Nishimura ◽  
Makoto Yamaguchi ◽  
...  
Keyword(s):  
Single Crystal ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Diamond Surface ◽  
Single Crystal Diamond

Single-crystal diamond tools formed using a focused ion beam: Tool life enhancement via heat treatment

2014 ◽  
Vol 49 ◽  
pp. 14-18 ◽  
Author(s):  
Noritaka Kawasegi ◽  
Kazuma Ozaki ◽  
Noboru Morita ◽  
Kazuhito Nishimura ◽  
Hideki Sasaoka
Keyword(s):  
Heat Treatment ◽  
Single Crystal ◽  
Tool Life ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Diamond Tools ◽  
Single Crystal Diamond ◽  
Life Enhancement
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