Electronic structure of molybdenum-involved amorphous silica buffer layer in MoOx/n-Si heterojunction

2019 ◽  
Vol 473 ◽  
pp. 20-24 ◽  
Author(s):  
Dongyun Chen ◽  
Ming Gao ◽  
Yazhou Wan ◽  
Yonghua Li ◽  
Haibo Guo ◽  
...  
2008 ◽  
Vol 2008 ◽  
pp. 1-4
Author(s):  
Dmitry E. Milovzorov

The structural, optical, and conductivity properties of silicon film deposited on cerium dioxide buffer layer were studied. The electronic structure of system consists of various defect levels inside band gap. The temperature spatial distribution plays a great role in silicon crystallization. The field destruction of crystal phase and its restoration, after annealing, were investigated.


2018 ◽  
Vol 26 (5) ◽  
pp. 359-366 ◽  
Author(s):  
Dirk Hauschild ◽  
Frank Meyer ◽  
Andreas Benkert ◽  
Dagmar Kreikemeyer-Lorenzo ◽  
Thomas Dalibor ◽  
...  

2018 ◽  
Vol 122 (8) ◽  
pp. 4349-4358 ◽  
Author(s):  
Nathan M. Peek ◽  
David B. Jeffcoat ◽  
Cristina Moisii ◽  
Lambertus van de Burgt ◽  
Salvatore Profeta ◽  
...  

1997 ◽  
Vol 56 (15) ◽  
pp. 9469-9476 ◽  
Author(s):  
Thorsten Koslowski ◽  
Walter Kob ◽  
Katharina Vollmayr

2011 ◽  
Vol 23 (23) ◽  
pp. 5168-5176 ◽  
Author(s):  
A. Lafond ◽  
X. Rocquefelte ◽  
M. Paris ◽  
C. Guillot-Deudon ◽  
V. Jouenne

ChemInform ◽  
2012 ◽  
Vol 43 (9) ◽  
pp. no-no
Author(s):  
A. Lafond ◽  
X. Rocquefelte ◽  
M. Paris ◽  
C. Guillot-Deudon ◽  
V. Jouenne

Author(s):  
П.В. Середин ◽  
А.С. Леньшин ◽  
Д.С. Золотухин ◽  
Д.Л. Голощапов ◽  
А.М. Мизеров ◽  
...  

This paper reports on influence of the nanoporous Si buffer layer on morphological, physical and structural properties of the InxGa1-xN layer with nanocolumnar morphology of the surface, grown by plasma assisted molecular beam epitaxy on the traditional Si(111) substrates. By means of various structural and spectroscopy methods electronic structure, morphology of the surface and optical properties of grown heterostructures was studied. We showed that usage of por-Si ad-layer helps to achieve more isotropic InGaN nanocolumns diameter distribution as well as to increase PL intensity up to 25%.


2019 ◽  
Vol 21 (3) ◽  
pp. 1285-1293 ◽  
Author(s):  
Zhongjun Li ◽  
Mingzhi Qian ◽  
Lingling Song ◽  
Liang Ma ◽  
Huaili Qiu ◽  
...  

Ohmic contact in m-InP3 and G or Ni interface is achieved by introducing intrinsic defects and inserting a buffer layer.


2020 ◽  
Vol 243 ◽  
pp. 146977
Author(s):  
A. Calloni ◽  
M.S. Jagadeesh ◽  
M. Zani ◽  
L. Duò ◽  
F. Ciccacci ◽  
...  

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