Atomically flat surface of (001) textured FePt thin films by residual stress control

2015 ◽  
Vol 354 ◽  
pp. 201-205 ◽  
Author(s):  
S.H. Liu ◽  
S.N. Hsiao ◽  
C.L. Chou ◽  
S.K. Chen ◽  
H.Y. Lee
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Flat Surface ◽  
Stress Control ◽  
Atomically Flat ◽  
Fept Thin Films

Wet chemical deposition of single crystalline epitaxial manganite thin films with atomically flat surface

2013 ◽  
Vol 534 ◽  
pp. 67-69 ◽  
Author(s):  
Amita Mishra ◽  
Anirban Dutta ◽  
Sayanti Samaddar ◽  
Anjan K. Gupta
Keyword(s):  
Thin Films ◽  
Flat Surface ◽  
Chemical Deposition ◽  
Single Crystalline ◽  
Wet Chemical ◽  
Atomically Flat

Critical thickness for stripe domain formation in FePt thin films: Dependence on residual stress

2016 ◽  
Vol 119 (8) ◽  
pp. 083906 ◽  
Author(s):  
N. R. Álvarez ◽  
J. E. Gómez ◽  
A. E. Moya Riffo ◽  
M. A. Vicente Álvarez ◽  
A. Butera
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Critical Thickness ◽  
Domain Formation ◽  
Stripe Domain ◽  
Fept Thin Films

scholarly journals Single-Domain and Atomically Flat Surface of κ-Ga2O3 Thin Films on FZ-Grown ε-GaFeO3 Substrates via Step-Flow Growth Mode

ACS Omega ◽  
2020 ◽  
Vol 5 (45) ◽  
pp. 29585-29592
Author(s):  
Hiroyuki Nishinaka ◽  
Osamu Ueda ◽  
Daisuke Tahara ◽  
Yusuke Ito ◽  
Noriaki Ikenaga ◽  
...  
Keyword(s):  
Thin Films ◽  
Flat Surface ◽  
Single Domain ◽  
Growth Mode ◽  
Step Flow ◽  
Step Flow Growth ◽  
Atomically Flat

Residual stress control in MoCr thin films deposited by ionized magnetron sputtering

2006 ◽  
Vol 200 (22-23) ◽  
pp. 6549-6553 ◽  
Author(s):  
J. Tranchant ◽  
B. Angleraud ◽  
P.Y. Tessier ◽  
M.P. Besland ◽  
J.P. Landesman ◽  
...  
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Stress Control

L10 Ordering of FePt Thin Films by Rapid Thermal Annealing

2003 ◽  
Vol 27 (11) ◽  
pp. 1083-1086 ◽  
Author(s):  
H. Ito ◽  
T. Kusunoki ◽  
H. Saito ◽  
S. Ishio
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Fept Thin Films

Residual stress and mechanical properties of polyimide thin films

2009 ◽  
Vol 113 (2) ◽  
pp. 976-983 ◽  
Author(s):  
Wonbong Jang ◽  
Jongchul Seo ◽  
Choonkeun Lee ◽  
Sang-Hyon Paek ◽  
Haksoo Han
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Residual Stress

scholarly journals Evolution of High-Quality Homoepitaxial CVD Diamond Films Induced by Methane Concentration

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 888
Author(s):  
Pengfei Zhang ◽  
Weidong Chen ◽  
Longhui Zhang ◽  
Shi He ◽  
Hongxing Wang ◽  
...  
Keyword(s):  
Methane Concentration ◽  
Flat Surface ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
High Quality ◽  
Effect Analysis ◽  
Plasma Chemical Vapor Deposition ◽  
Atomically Flat

In this paper, we successfully synthesized homoepitaxial diamond with high quality and atomically flat surface by microwave plasma chemical vapor deposition. The sample presents a growth rate of 3 μm/h, the lowest RMS of 0.573 nm, and the narrowest XRD FWHM of 31.32 arcsec. An effect analysis was also applied to discuss the influence of methane concentration on the diamond substrates.

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