Effect of nitrogen partial pressure on Al–Ti–N films deposited by arc ion plating

2011 ◽  
Vol 258 (5) ◽  
pp. 1819-1825 ◽  
Author(s):  
Fei Cai ◽  
Shihong Zhang ◽  
Jinlong Li ◽  
Zhong Chen ◽  
Mingxi Li ◽  
...  
2011 ◽  
Vol 345 ◽  
pp. 87-92
Author(s):  
Shu Juan Zhang ◽  
Ming Sheng Li ◽  
Zhi Qin Chen ◽  
Jun Xi Hu

TiO2thin films of different N-doped quantity and different current density were deposited on medical glass slide by arc ion plating. Film structure, surface morphology and optical properties were measured with XRD, SEM and UV-VIS transmittance spectroscope. Photo-catalytic performance of the films was evaluated by degradation methyl orange. The current density, O2partial pressure and N2partial pressure were varied in order to determine their effect on the properties of TiO2films. The study got the best doped process (current 50A,O250sccm, N2250 sccm, Ar 20sccm). In these experimental conditions, the absorption edge successfully moved to 510nm, the as-deposited TiO2films structure was composed with anatase and rutile. The annealing treatment made the crystal microscopy more obviously. The N-doped TiO2film not only reduced the UV catalytic performance , but also extended the catalytic properties to the sun light.


2012 ◽  
Vol 217-219 ◽  
pp. 1083-1086
Author(s):  
Hui Xia Zhang ◽  
Hong Wei Zhan

After ion nitriding, prepare composite film on surface coating processing by multi-arc ion plating. Experimentally analyses the properties of surface pattern, adhesion strength and vickers hardness in different nitrogen partial pressure. It is found that an optimum value is existed in the nitrogen partial pressure parameter designing range for obtaining optimal performance of TiAlN composite film.


2012 ◽  
Vol 706-709 ◽  
pp. 2589-2595
Author(s):  
Kyeong Cheol Baek ◽  
Chan Yeol Seo ◽  
Ki Bok Heo ◽  
Yang Soo Kim ◽  
Dong Joo Yoon ◽  
...  

Arc ion plating (AIP) is one of the most attractive physical vapour deposition (PVD) method for the industrial manufacture of TiN coatings, owing to a high degree of ionization in the target material and convenient control of the process parameters. The important characteristic of hard coating is the adhesion strength between the coating layer and the substrate. The coating will be subjected to various loads, such as mechanical, thermal load, etc., in practical applications. Therefore, for more than a decade, Ti-based hard coatings have been applied to tools, dies, and mechanical parts because of the enhance lifetime and performance. It is focus on the attractive properties such as high hardness, good wear, and chemical stability. In the present study, TiN monolayer film was prepared at various N2 partial pressures and current by the AIP technique in SACM645 material. The correlation between microstructure and properties of the TiN coating was comparatively investigated by XRD, FE-SEM and AFM. These study carried steadily out improve the adhesion properties and wear resistance of Ti-based coating using pre-treatment of the substrate, insertion of an interlayer, application of multi-layers and adjustment of the process parameters. The main phase FCC TiN displayed (200) orientation in the film with the highest N2partial pressure. The (111) orientation was observed with decreasing N2partial pressure. The (200) and (111) textures in the film which was treated 80A arc current were found to be competitive orientations, however stronger arc treated the (200) texture was increased. The multilayer TiN films has possessed high hardness (up to 42Nm) and the best wear resistance among the specimens. These features were attributed to the presence of dense microstructures that were mainly composed of TiN phase around 5.16㎛ thickness, HF1 adhesion and Ra 35㎚ surface roughness


2004 ◽  
Vol 55 (4) ◽  
pp. 271-275
Author(s):  
Yukio IDE ◽  
Satoshi NAKAMURA ◽  
Akihiro NINO ◽  
Katsuhiko KISHITAKE

Vacuum ◽  
2021 ◽  
pp. 110152
Author(s):  
Lijun Xian ◽  
Haibo Zhao ◽  
Guang Xian ◽  
Chencheng Wang ◽  
Hong He

Rare Metals ◽  
2016 ◽  
Vol 36 (11) ◽  
pp. 858-864 ◽  
Author(s):  
Jin-Long Li ◽  
Gang-Yi Cai ◽  
Hua-Sheng Zhong ◽  
Yong-Xin Wang ◽  
Jian-Min Chen

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