Effect of structure variation on thermal conductivity of hydrogenated silicon film

2011 ◽  
Vol 257 (20) ◽  
pp. 8326-8329 ◽  
Author(s):  
Shibin Li ◽  
Yadong Jiang ◽  
Zhiming Wu ◽  
Jiang Wu ◽  
Zhihua Ying ◽  
...  
Keyword(s):  
Thermal Conductivity ◽  
Silicon Film ◽  
Structure Variation ◽  
Hydrogenated Silicon ◽  
Effect Of Structure

Enhancement of thermal conductivity of hydrogenated silicon film by microcrystalline structure growth

2011 ◽  
Vol 23 (1) ◽  
pp. 224-228
Author(s):  
Shibin Li ◽  
Yadong Jiang ◽  
Zhiming Wu ◽  
Jiang Wu ◽  
Zhihua Ying ◽  
...  
Keyword(s):  
Thermal Conductivity ◽  
Silicon Film ◽  
Microcrystalline Structure ◽  
Hydrogenated Silicon

Non-steady-state measurements of the thermal conductivities of liquid polyphenyls

1963 ◽  
Vol 273 (1353) ◽  
pp. 259-274 ◽  
Keyword(s):  
Thermal Conductivity ◽  
Thermal Expansion ◽  
Steady State ◽  
Temperature Dependence ◽  
Line Source ◽  
Coefficient Of Thermal Expansion ◽  
Liquid Benzene ◽  
Extended Range ◽  
Benzene Toluene ◽  
Effect Of Structure

A line source technique has been developed for non-steady-state measurements of the therm al conductivities of liquids over an extended range of temperature. The accuracy of the method, which is an absolute one, has been critically exam ined. T hermal conductivities of liquid benzene, toluene, diphenyl, o-,m - and^p-terphenyl, estimated to be accurate to + 0*25 % , have been obtained. These results are discussed in terms of the effect of structure on the transport properties of liquids and the relation between the coefficient of thermal expansion and the temperature dependence of thermal conductivity.

The Effect of Structure on the Thermal Conductivity of Plasma Sprayed Alumina

1983 ◽  
Vol 30 ◽  
Author(s):  
H.C. Fiedler
Keyword(s):  
Thermal Conductivity ◽  
Elevated Temperature ◽  
Alpha Phase ◽  
Gamma Phase ◽  
Deposition Surface ◽  
The Poor ◽  
Plasma Sprayed ◽  
Alpha Alumina ◽  
Effect Of Structure

ABSTRACTPlasma sprayed deposits of alumina are normally of the metastable gamma phase, which transforms to alpha upon heating to an elevated temperature. The poor thermal conductivity of gamma phase is improved by transforming to alpha, but the improvement is restricted by the fragmented nature of the structure, a consequence of alpha being a denser phase than gamma.Alpha phase has been reported to form when deposits are made on preheated substrates. It was found that reducing the distance between gun and deposition surface, thereby raising the temperature of the latter, resulted in transforming gamma to alpha, and as the temperature continued to rise, alpha formed directly from the liquid. The thermal conductivity of alpha formed directly from the liquid is 0.27 Watt/cm K at 323 K, which approaches the thermal conductivity given for 99.5% pure, 98% dense, polycrystalline alpha alumina.

A Simple Method for Determination of Thermal Conductivity Coefficients of Thin Films

2001 ◽  
Author(s):  
Chi Hsiang Pan ◽  
Chien Li Tung
Keyword(s):  
Thin Films ◽  
Thermal Conductivity ◽  
Thermal Conductivity Coefficient ◽  
Crystalline Silicon ◽  
Silicon Film ◽  
Simple Method ◽  
Active Devices ◽  
Analytical Expressions

Abstract In this paper, we present a simple method to determine thermal conductivity coefficients (TCC) of thin films with a compact characterization microstructure and by using common measuring apparatus. The microstructure can be fabricated by a simple surface micromachining technique and in situ along with active devices on the same chip. Analytical expressions are derived to calculate the thermal conductivity coefficients of thin films from the experimental data. Experimental results with a heavily n-doped LPCVD poly crystalline silicon film are used herein to demonstrate the effectiveness of the proposed method. The obtained thermal conductivity coefficient seems to decrease a little as temperature increase and the average is around 39 Wm−1 °C−1 at 400°C below.

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