Effects of rf power on surface-morphological, structural and electrical properties of aluminium-doped zinc oxide films by magnetron sputtering

2008 ◽  
Vol 254 (13) ◽  
pp. 4171-4178 ◽  
Author(s):  
Dengyuan Song
Keyword(s):  
Zinc Oxide ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Oxide Films ◽  
Rf Power ◽  
Zinc Oxide Films ◽  
Structural And Electrical Properties

Effects of RF power on the structural, optical and electrical properties of Al-doped zinc oxide films

2010 ◽  
Vol 50 (5) ◽  
pp. 730-733 ◽  
Author(s):  
Shou-Yi Kuo ◽  
Kou-Chen Liu ◽  
Fang-I Lai ◽  
Jui-Fu Yang ◽  
Wei-Chun Chen ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Electrical Properties ◽  
Oxide Films ◽  
Optical And Electrical Properties ◽  
Rf Power ◽  
Zinc Oxide Films

The effect of the oxygen concentration and the rf power on the zinc oxide films properties deposited by magnetron sputtering

2005 ◽  
Vol 245 (1-4) ◽  
pp. 273-280 ◽  
Author(s):  
I. Sayago ◽  
M. Aleixandre ◽  
L. Arés ◽  
M.J. Fernández ◽  
J.P. Santos ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Oxygen Concentration ◽  
Oxide Films ◽  
Rf Power ◽  
Zinc Oxide Films

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

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