The effect of the oxygen concentration and the rf power on the zinc oxide films properties deposited by magnetron sputtering

2005 ◽  
Vol 245 (1-4) ◽  
pp. 273-280 ◽  
Author(s):  
I. Sayago ◽  
M. Aleixandre ◽  
L. Arés ◽  
M.J. Fernández ◽  
J.P. Santos ◽  
...  
Author(s):  
T. A. Emma ◽  
M. P. Singh

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.


2007 ◽  
Vol 46 (6A) ◽  
pp. 3319-3323 ◽  
Author(s):  
Takahiro Hiramatsu ◽  
Mamoru Furuta ◽  
Hiroshi Furuta ◽  
Tokiyoshi Matsuda ◽  
Takashi Hirao

2005 ◽  
Vol 148 (1) ◽  
pp. 37-41 ◽  
Author(s):  
I. Sayago ◽  
M. Aleixandre ◽  
A. Martínez ◽  
M.J. Fernández ◽  
J.P. Santos ◽  
...  

2020 ◽  
Vol 126 (11) ◽  
Author(s):  
Mohamed Fathy Hasaneen ◽  
M. M. Abd El-Raheem ◽  
Mahrous R. Ahmed

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