Formation of isotope controlled SiC thin film by plasma chemical vapor deposition and its characterization

H. Suzuki; H. Araki; W. Yang; T. Noda

doi:10.1016/j.apsusc.2004.09.043

Formation of isotope controlled SiC thin film by plasma chemical vapor deposition and its characterization

Applied Surface Science ◽

10.1016/j.apsusc.2004.09.043 ◽

2005 ◽

Vol 241 (1-2) ◽

pp. 266-269 ◽

Cited By ~ 2

Author(s):

H. Suzuki ◽

H. Araki ◽

W. Yang ◽

T. Noda

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00540-4 ◽

1999 ◽

Vol 354 (1-2) ◽

pp. 24-28 ◽

Cited By ~ 6

Author(s):

K.K. Chattopadhyay ◽

S. Matsumoto ◽

Y.-F. Zhang ◽

I. Sakaguchi ◽

M. Nishitani-Gamo ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Film Synthesis

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Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Journal of the Korean Physical Society ◽

10.3938/jkps.54.194 ◽

2009 ◽

Vol 54 (1) ◽

pp. 194-199 ◽

Cited By ~ 12

Author(s):

Minsung Jeon ◽

Shuhei Yoshiba ◽

Koichi Kamisako

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Solar Cell ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Diamond thin film preparation by microwave plasma chemical vapor deposition under the open-air condition

2009 IEEE International Conference on Plasma Science - Abstracts ◽

10.1109/plasma.2009.5227474 ◽

2009 ◽

Author(s):

Kenichiro Hamanishi ◽

Hiroyuki Goto ◽

Hideki Motomura ◽

Masafumi Jinno ◽

Hidetsugu Yagi

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Diamond Thin Film ◽

Thin Film Preparation ◽

Film Preparation

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Polycrystalline silicon thin film transistors deposited at low substrate temperature by remote plasma chemical vapor deposition using SiF4/H2

Applied Physics Letters ◽

10.1063/1.112937 ◽

1994 ◽

Vol 65 (13) ◽

pp. 1644-1646 ◽

Cited By ~ 33

Author(s):

Jae Ik Woo ◽

Hong Joo Lim ◽

Jin Jang

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Substrate Temperature ◽

Vapor Deposition ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition

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Fabrication of Oxidative Thin Film with Process Conditions by Transformer Coupled Plasma Chemical Vapor Deposition

Applied Science and Convergence Technology ◽

10.5757/jkvs.2010.19.2.148 ◽

2010 ◽

Vol 19 (2) ◽

pp. 148-154 ◽

Cited By ~ 2

Author(s):

T.J. Gim ◽

Y. Choi ◽

P.K. Shin ◽

G.B. Park ◽

H.Y. Shin ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Process Conditions ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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High performance poly-crystalline silicon thin film transistors fabricated using remote plasma chemical vapor deposition of SiO/sub 2/

IEEE Electron Device Letters ◽

10.1109/55.285370 ◽

1994 ◽

Vol 15 (2) ◽

pp. 69-71 ◽

Cited By ~ 24

Author(s):

M. Sekiya ◽

M. Hara ◽

N. Sano ◽

A. Kohno ◽

T. Sameshima

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thin Film Transistors ◽

High Performance ◽

Crystalline Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition

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Thin film characterization of diamond-like carbon films prepared by r.f. plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(97)00022-9 ◽

1997 ◽

Vol 302 (1-2) ◽

pp. 5-11 ◽

Cited By ~ 25

Author(s):

Kenji K. Hirakuri ◽

Takumi Minorikawa ◽

Gernot Friedbacher ◽

Manfred Grasserbauer

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Thin Film Characterization

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Trimethylboron as Single-Source Precursor for Boron–Carbon Thin Film Synthesis by Plasma Chemical Vapor Deposition

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.6b06529 ◽

2016 ◽

Vol 120 (38) ◽

pp. 21990-21997 ◽

Cited By ~ 5

Author(s):

Mewlude Imam ◽

Carina Höglund ◽

Jens Jensen ◽

Susann Schmidt ◽

Ivan G. Ivanov ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Single Source ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Single Source Precursor ◽

Film Synthesis ◽

Boron Carbon

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Homoepitaxial Growth of 4H-SiC Thin Film Below 1000°C by Microwave Plasma Chemical Vapor Deposition

Materials Science Forum ◽

10.4028/www.scientific.net/msf.389-393.299 ◽

2002 ◽

Vol 389-393 ◽

pp. 299-302 ◽

Cited By ~ 2

Author(s):

Mitsuo Okamoto ◽

Yasunori Tanaka ◽

Ryouji Kosugi ◽

Daisuke Takeuchi ◽

Shinichi Nakashima ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Homoepitaxial Growth

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Prediction of TiO2 Thin Film Growth on the Glass Beads in a Rotating Plasma Chemical Vapor Deposition Reactor

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2010.2320 ◽

2010 ◽

Vol 10 (5) ◽

pp. 3211-3215 ◽

Cited By ~ 1

Author(s):

Dong-Joo Kim ◽

Kyo-Seon Kim

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Film Growth ◽

Chemical Vapor ◽

Glass Beads ◽

Thin Film Growth ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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