High performance poly-crystalline silicon thin film transistors fabricated using remote plasma chemical vapor deposition of SiO/sub 2/

M. Sekiya; M. Hara; N. Sano; A. Kohno; T. Sameshima

doi:10.1109/55.285370

High performance poly-crystalline silicon thin film transistors fabricated using remote plasma chemical vapor deposition of SiO/sub 2/

IEEE Electron Device Letters ◽

10.1109/55.285370 ◽

1994 ◽

Vol 15 (2) ◽

pp. 69-71 ◽

Cited By ~ 24

Author(s):

M. Sekiya ◽

M. Hara ◽

N. Sano ◽

A. Kohno ◽

T. Sameshima

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thin Film Transistors ◽

High Performance ◽

Crystalline Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition

Download Full-text

Polycrystalline silicon thin film transistors deposited at low substrate temperature by remote plasma chemical vapor deposition using SiF4/H2

Applied Physics Letters ◽

10.1063/1.112937 ◽

1994 ◽

Vol 65 (13) ◽

pp. 1644-1646 ◽

Cited By ~ 33

Author(s):

Jae Ik Woo ◽

Hong Joo Lim ◽

Jin Jang

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Substrate Temperature ◽

Vapor Deposition ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition

Download Full-text

Batch-Process for High Performance Amorphous-Silicon Thin-Film Transistors Using Hot-Wall Chemical-Vapor-Deposition Method

10.7567/ssdm.1991.pc5-2 ◽

1991 ◽

Author(s):

Byung-Chul AHN ◽

Kazuhiro SHIMIZU ◽

Tsutomu SATOH ◽

Hiroshi KANOH ◽

Osamu SUGIURA ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thin Film Transistors ◽

High Performance ◽

Chemical Vapor ◽

Batch Process ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Silicon Thin Film

Download Full-text

High performance amorphous-silicon thin film transistors prepared by catalytic chemical vapor deposition with high deposition rate

Thin Solid Films ◽

10.1016/s0040-6090(01)01289-5 ◽

2001 ◽

Vol 395 (1-2) ◽

pp. 330-334 ◽

Cited By ~ 19

Author(s):

Masahiro Sakai ◽

Takayuki Tsutsumi ◽

Tatsuo Yoshioka ◽

Atsushi Masuda ◽

Hideki Matsumura

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Deposition Rate ◽

Vapor Deposition ◽

Thin Film Transistors ◽

High Performance ◽

Chemical Vapor ◽

High Deposition Rate ◽

Silicon Thin Film

Download Full-text

High-performance n-channel 13.56MHz plasma-enhanced chemical vapor deposition nanocrystalline silicon thin-film transistors

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.2194027 ◽

2006 ◽

Vol 24 (3) ◽

pp. 618-623 ◽

Cited By ~ 8

Author(s):

Czang-Ho Lee ◽

Andrei Sazonov ◽

Arokia Nathan

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thin Film Transistors ◽

High Performance ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Silicon Thin Film

Download Full-text

Coplanar amorphous silicon thin film transistor fabricated by inductively coupled plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.368581 ◽

1998 ◽

Vol 84 (7) ◽

pp. 4006-4012 ◽

Cited By ~ 15

Author(s):

Sung Ki Kim ◽

Young Jin Choi ◽

Kyu Sik Cho ◽

Jin Jang

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Thin Film Transistor ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Thin Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

Download Full-text

Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00540-4 ◽

1999 ◽

Vol 354 (1-2) ◽

pp. 24-28 ◽

Cited By ~ 6

Author(s):

K.K. Chattopadhyay ◽

S. Matsumoto ◽

Y.-F. Zhang ◽

I. Sakaguchi ◽

M. Nishitani-Gamo ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Film Synthesis

Download Full-text

Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Journal of the Korean Physical Society ◽

10.3938/jkps.54.194 ◽

2009 ◽

Vol 54 (1) ◽

pp. 194-199 ◽

Cited By ~ 12

Author(s):

Minsung Jeon ◽

Shuhei Yoshiba ◽

Koichi Kamisako

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Solar Cell ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Download Full-text

High-Performance SiOF Film Fabricated Using a Dual-Frequency-Plasma Chemical Vapor Deposition system

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.5984 ◽

2004 ◽

Vol 43 (9A) ◽

pp. 5984-5989 ◽

Cited By ~ 6

Author(s):

Takashi Yoda ◽

Keiji Fujita ◽

Hideshi Miyajima ◽

Rempei Nakata ◽

Yukio Nishiyama ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Performance ◽

Chemical Vapor ◽

Dual Frequency ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

Download Full-text

Diamond thin film preparation by microwave plasma chemical vapor deposition under the open-air condition

2009 IEEE International Conference on Plasma Science - Abstracts ◽

10.1109/plasma.2009.5227474 ◽

2009 ◽

Author(s):

Kenichiro Hamanishi ◽

Hiroyuki Goto ◽

Hideki Motomura ◽

Masafumi Jinno ◽

Hidetsugu Yagi

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Diamond Thin Film ◽

Thin Film Preparation ◽

Film Preparation

Download Full-text

Fabrication of Oxidative Thin Film with Process Conditions by Transformer Coupled Plasma Chemical Vapor Deposition

Applied Science and Convergence Technology ◽

10.5757/jkvs.2010.19.2.148 ◽

2010 ◽

Vol 19 (2) ◽

pp. 148-154 ◽

Cited By ~ 2

Author(s):

T.J. Gim ◽

Y. Choi ◽

P.K. Shin ◽

G.B. Park ◽

H.Y. Shin ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Process Conditions ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Download Full-text