Ultrafine aluminum oxide powder prepared by chemical vapor deposition of trimethylaluminum

Kwang Ho Kim; C. H. Ho; Tae-Gyo Suh; S. Prakash; R. F. Bunshah

doi:10.1007/bf02834178

Ultrafine aluminum oxide powder prepared by chemical vapor deposition of trimethylaluminum

Journal of Materials Engineering ◽

10.1007/bf02834178 ◽

1991 ◽

Vol 13 (3) ◽

pp. 199-205 ◽

Cited By ~ 7

Author(s):

Kwang Ho Kim ◽

C. H. Ho ◽

Tae-Gyo Suh ◽

S. Prakash ◽

R. F. Bunshah

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Powder ◽

Aluminum Oxide Powder ◽

Ultrafine Aluminum

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Preparation and characterization of aluminum oxide films by plasma enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(96)03100-3 ◽

1997 ◽

Vol 90 (1-2) ◽

pp. 102-106 ◽

Cited By ~ 26

Author(s):

C.H. Lin ◽

H.L. Wang ◽

M.H. Hon

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Oxide Films ◽

Chemical Vapor

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X‐ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide

Applied Physics Letters ◽

10.1063/1.107407 ◽

1992 ◽

Vol 60 (10) ◽

pp. 1208-1210 ◽

Cited By ~ 1

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Spectroscopy Analysis ◽

X Ray ◽

Hydrogenated Amorphous

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Cited By ~ 34

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses

Plasma Processes and Polymers ◽

10.1002/ppap.201100196 ◽

2012 ◽

Vol 9 (8) ◽

pp. 761-771 ◽

Cited By ~ 11

Author(s):

G. Dingemans ◽

M. C. M. van de Sanden ◽

W. M. M. Kessels

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor

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ChemInform Abstract: CHEMICAL VAPOR DEPOSITION OF ALUMINUM OXIDE THIN FILMS UNDER REDUCED PRESSURES

Chemischer Informationsdienst ◽

10.1002/chin.198530397 ◽

1985 ◽

Vol 16 (30) ◽

Author(s):

J. SARAIE ◽

J. KWON ◽

Y. YODOGAWA

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Reduced Pressures

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Metal-organic chemical vapor deposition of aluminum oxide thin films via pyrolysis of dimethylaluminum isopropoxide

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3294718 ◽

2010 ◽

Vol 28 (2) ◽

pp. 238-243 ◽

Cited By ~ 2

Author(s):

Benjamin W. Schmidt ◽

William J. Sweet ◽

Eric J. Bierschenk ◽

Cameron K. Gren ◽

Timothy P. Hanusa ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Oxide Thin Films ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Metalorganic chemical vapor deposition of aluminum oxide on Si: Evidence of interface SiO2 formation

Applied Physics Letters ◽

10.1063/1.1483903 ◽

2002 ◽

Vol 80 (22) ◽

pp. 4241-4243 ◽

Cited By ~ 65

Author(s):

A. Roy Chowdhuri ◽

C. G. Takoudis ◽

R. F. Klie ◽

N. D. Browning

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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High Quality Aluminum Oxide Passivation Layer for Crystalline Silicon Solar Cells Deposited by Parallel-Plate Plasma-Enhanced Chemical Vapor Deposition

Applied Physics Express ◽

10.1143/apex.3.012301 ◽

2009 ◽

Vol 3 (1) ◽

pp. 012301 ◽

Cited By ~ 86

Author(s):

Shinsuke Miyajima ◽

Junpei Irikawa ◽

Akira Yamada ◽

Makoto Konagai

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Parallel Plate ◽

Crystalline Silicon ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

High Quality ◽

Crystalline Silicon Solar Cells

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Studies on hot filament chemical vapor deposition of diamond onto aluminum oxide

Materials Science and Engineering B ◽

10.1016/0921-5107(96)01579-6 ◽

1996 ◽

Vol 39 (3) ◽

pp. L5-L9 ◽

Cited By ~ 7

Author(s):

A.V. Sumant ◽

V.P. Godbole ◽

S.T. Kshirsagar

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Filament

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Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition system engineered for self-limiting growth of aluminum oxide thin films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2007.04.076 ◽

2007 ◽

Vol 201 (22-23) ◽

pp. 8991-8997 ◽

Cited By ~ 28

Author(s):

Scott F. Szymanski ◽

Michael T. Seman ◽

Colin A. Wolden

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Pulsed Plasma ◽

Oxide Thin Films ◽

Phase Characterization

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