The determination of the refractive index and the thickness of thin films of aluminium oxide on aluminium by the polarimetric method

1954 ◽  
Vol 4 (2) ◽  
pp. 204-219 ◽  
Author(s):  
Antonín Vašíček
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Aluminium Oxide

scholarly journals Determination of refractive index and layer thickness of nm-thin films via ellipsometry

2017 ◽  
Vol 25 (22) ◽  
pp. 27077 ◽  
Author(s):  
Peter Nestler ◽  
Christiane A. Helm
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Layer Thickness

Determination of thin film refractive index and thickness by means of film phase thickness

Open Physics ◽  
2008 ◽  
Vol 6 (2) ◽  
Author(s):  
Milen Nenkov ◽  
Tamara Pencheva
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Refractive Index ◽  
Barium Titanate ◽  
Spectral Region ◽  
Complex Refractive Index ◽  
Refractive Index Dispersion ◽  
New Approach ◽  
Phase Thickness

AbstractA new approach for determination of refractive index dispersion n(λ) (the real part of the complex refractive index) and thickness d of thin films of negligible absorption and weak dispersion is proposed. The calculation procedure is based on determination of the phase thickness of the film in the spectral region of measured transmittance data. All points of measured spectra are included in the calculations. Barium titanate thin films are investigated in the spectral region 0.38–0.78 μm and their n(λ) and d are calculated. The approach is validated using Swanepoel’s method and it is found to be applicable for relatively thin films when measured transmittance spectra have one minimum and one maximum only.

Determination of refractive index, extinction coefficient and thickness of thin films by the method of waveguide mode excitation

2013 ◽  
Vol 43 (12) ◽  
pp. 1149-1153 ◽  
Author(s):  
V I Sokolov ◽  
N V Marusin ◽  
V Ya Panchenko ◽  
A G Savelyev ◽  
V N Seminogov ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Extinction Coefficient ◽  
Waveguide Mode ◽  
Mode Excitation

Model for Rapid Reverse Determination of the Refractive Index Bulk Inhomogeneity of Thin Films at Oblique Incidence

2016 ◽  
Vol 36 (1) ◽  
pp. 0131001
Author(s):  
简钰东 Jian Yudong ◽  
汤建勋 Tang Jianxun ◽  
吴素勇 Wu Suyong ◽  
谭中奇 Tan Zhongqi
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Oblique Incidence

Spectroscopic Ellipsometry Analyses on Plasma Treatment of Aluminium Oxide Thin Film

2016 ◽  
Vol 675-676 ◽  
pp. 197-200
Author(s):  
Tossaporn Lertvanithphol ◽  
W. Rakreungdet ◽  
Pitak Eiamchai ◽  
M. Horprathum ◽  
C. Hom-On ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Plasma Treatment ◽  
Spectroscopic Ellipsometry ◽  
Optical Model ◽  
Incidence Angle ◽  
Aluminium Oxide ◽  
Oxide Thin Film ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films

Spectroscopic Ellipsometry (SE) was used to analyse the effect of plasma treatment on aluminium oxide thin films. The aluminium oxide thin films were fabricated by reactive DC magnetron sputtering at different operating pressures. The as-deposited thin films were plasma treated at different ambient Ar and O2 conditions. The prepared samples were investigated for physical microstructures with scanning electron microscopy (SEM) and optical characteristics with ellipsometry. The ellipsometric spectra of the prepared samples were measured in the range of 250 to 1650 nm with the incidence angle of 70 degree. Based on the optical model with the Tauc-Lorentz function, the thickness and the refractive index of the films were determined and discussed. The results showed that the thickness and the refractive index of the aluminium oxide thin films were greatly affected after the plasma treatments. In comparison, the results of those prepared at different operating pressures were also discussed. The SE results were confirmed with those from SEM.

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