Kinetics of O2 + TEOS gas-phase chemical reactions in a remote RF plasma reactor with electron spin resonance

1996 ◽  
Vol 16 (2) ◽  
pp. 187-194 ◽  
Author(s):  
J. Janča ◽  
A. Tálský ◽  
V. Zvoníček
1991 ◽  
Vol 219 ◽  
Author(s):  
N. M. Johnson ◽  
Paulo V. Santos ◽  
J. Walker ◽  
K. S. Stevens

ABSTRACTGas-phase chemical reactions of interest for the deposition of amorphous silicon carbide in a remote hydrogen plasma reactor have been quantitatively characterized with electron spin resonance, and the deposition of a-SiC:H from silane and acetylene is demonstrated.


The electron spin resonance method was employed to study the nature, concentration and kinetics of the disappearance under varying conditions of radicals produced in polyethylene by fast electron irradiation at 77°K. The predominant radical species at 77°K is the alkyl radical —CH 2 —ĊH—CH 2 —. On being warmed to room temperature it disappears rapidly, revealing a more stable un­identified radical. The kinetics of the decay at room temperature of both radicals was observed. Their stabilities were found to vary in polyethylene samples of differing physical and chemical properties. G values for these radicals are given. Comparison was made with spectra obtained under similar conditions with two pure paraffins and a pure olefin to evaluate the effect of crystallinity branching, molecular weight and unsaturation. In the olefin there is evidence for a build-up of allyl radicals due to the encounter of an alkyl radical with main chain unsaturation. This supports the view that alkyl radicals are mobile, and cross-linking occurs when two such radicals meet.


1968 ◽  
Vol 72 (7) ◽  
pp. 2541-2547 ◽  
Author(s):  
Ryo Hirasawa ◽  
Takashi Mukaibo ◽  
Hideo Hasegawa ◽  
Noboru Odan ◽  
Tetsuo Maruyama

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